Difference between revisions of "Direct-Write Lithography Recipes"

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Photolithography Recipes for the [[Maskless Aligner (Heidelberg MLA150)|Heidelberg MLA150]].
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== Heidelberg Instruments MLA150 ==
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Photolithography Recipes for the [[Maskless Aligner (Heidelberg MLA150)|Heidelberg MLA150]]. ''Description of litho params- different lasers available, greyscale etc.''
  
== Positive Resist (MLA150) ==
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=== Positive Resist (MLA150) ===
General notes: Hotplates used, filters, laser wavelengths, etc.
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''General notes: Hotplates used, filters, laser wavelengths, etc.''
  
 
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*{{fl|SPR955CMstepperrecipe.pdf|See SPR955CM data file}}
 
*{{fl|SPR955CMstepperrecipe.pdf|See SPR955CM data file}}
 
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== Negative Resist (MLA150) ==
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=== Negative Resist (MLA150) ===
General notes: Hotplates used, filters, laser wavelengths, etc.
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''General notes: Hotplates used, filters, laser wavelengths, etc.''
  
 
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Revision as of 22:28, 13 September 2020

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Work In Progress

This article is still under construction. It may contain factual errors. Content is subject to change.


Heidelberg Instruments MLA150

Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.

Positive Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Developer Developer Time Comments
SPR955CM0.9 3 krpm/30” 95°C/60” ~ 0.9 um AZ300MIF

Negative Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Flood Developer Developer Time Comments
AZ5214 6 krpm/30” 95°C/60” ~ 1.0 um 60" AZ300MIF 60"
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