Atomic Layer Deposition Recipes

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Revision as of 07:44, 17 January 2018 by John d (talk | contribs) (added "contact bill mitchell" and Added Ru)
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Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

Pt deposition (ALD)


Ru (ALD)


SiO2 deposition (ALD)

ZnO deposition (ALD)

  • Need Data Al:ZnO

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer

TiN deposition (ALD)