Difference between revisions of "Atomic Layer Deposition Recipes"

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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}}
 
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}}
 
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}}
 
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}}
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==Pt deposition (ALD)==
 +
*Need Data
  
 
==SiO{{sub|2}} deposition (ALD)==
 
==SiO{{sub|2}} deposition (ALD)==
 
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}}
 
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}}
 
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}}
 
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}}
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==ZnO deposition (ALD)==
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*Need Data Al:ZnO
  
 
==ZrO{{sub|2}} deposition (ALD)==
 
==ZrO{{sub|2}} deposition (ALD)==
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==TiO{{sub|2}} deposition (ALD)==
 
==TiO{{sub|2}} deposition (ALD)==
 
*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer
 
*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer
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==TiN deposition (ALD)==
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*Need Data

Revision as of 16:36, 15 December 2015

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

Pt deposition (ALD)

  • Need Data

SiO2 deposition (ALD)

ZnO deposition (ALD)

  • Need Data Al:ZnO

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer

TiN deposition (ALD)

  • Need Data