Difference between revisions of "Atomic Layer Deposition Recipes"
Jump to navigation
Jump to search
Line 14: | Line 14: | ||
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
||
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
||
+ | |||
+ | ==SiO{{sub|2}} deposition== |
||
+ | *{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
||
+ | *{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
||
+ | |||
+ | ==ZrO{{sub|2}} deposition== |
||
+ | *{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
Revision as of 11:33, 6 September 2012
Back to Vacuum Deposition Recipes.