Difference between revisions of "Vacuum Deposition Recipes"
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(Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/") |
(Corrected Unaxis Dep links. New row: low-stress Nitride.) |
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| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R] |
| bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/wiki/index.php/PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R] |
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|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
|{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
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|{{rl|PECVD Recipes|SiN deposition (PECVD #2)}} |
|{{rl|PECVD Recipes|SiN deposition (PECVD #2)}} |
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− | |{{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}} |
+ | |{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}} |
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+ | !SiN - Low Stress |
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+ | !{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}} |
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+ | !{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}} |
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+ | !{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}} |
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! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
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| bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}} |
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+ | | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}} |
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
| bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
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Revision as of 18:00, 1 July 2020
- R = Recipe is available. Clicking this link will take you to the recipe.
- A = Material is available for use, but no recipes are provided.