Difference between revisions of "ICP Etching Recipes"
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=[[ICP-Etch (Unaxis VLR)]]= |
=[[ICP-Etch (Unaxis VLR)]]= |
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| − | ===GaAs Etch === |
+ | ===GaAs-AlGaAs Etch === |
*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]] |
*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]] |
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| − | ===AlGaAs Etch === |
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*[[media:14-AlAs-GR-cal_etch-Unaxis_ICP_etcher.pdf|AlGaAs Etch Recipe (30C)]] |
*[[media:14-AlAs-GR-cal_etch-Unaxis_ICP_etcher.pdf|AlGaAs Etch Recipe (30C)]] |
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| − | ==InP Etch (Unaxis VLR)== |
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| − | ===InP Etch === |
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| ⚫ | |||
| − | *[[media:18-InP-based_etching-Cl2N2Ar.pdf|InP-based Material Etch Profile (200C)]] |
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| − | + | ==InP-InGaAs-InAlAs Etch (Unaxis VLR)== |
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| − | *[[media:UNAXIS-VLR-InP-Etch |
+ | *[[media:UNAXIS-VLR-InP-Etch-200C-Recipe.pdf|InP Etch Recipe (Cl<sub>2</sub>N<sub>2</sub>Ar 200C)]] |
| − | *[[media: |
+ | *[[media:18-InP-based_etching-Cl2N2Ar.pdf|InP-based Material Etch Profile (Cl<sub>2</sub>N<sub>2</sub>Ar200C)]] |
| ⚫ | |||
| + | *[[media:17-InP%26InGaAs_etch-Cl2H2Ar-Unaxis-VLR.pdf|InP-InGaAs Etch Profile (Cl<sub>2</sub>H<sub>2</sub> Ar 200C)]] |
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==GaN Etch (Unaxis VLR)== |
==GaN Etch (Unaxis VLR)== |
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Revision as of 09:22, 23 October 2013
Back to Dry Etching Recipes.
Si Deep RIE (PlasmaTherm/Bosch Etch)
Single-step Si Etching (not Bosch Process!) (Si Deep RIE)
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
SiNx Etching (Panasonic 1)
Al Etch (Panasonic 1)
Cr Etch (Panasonic 1)
Ti Etch (Panasonic 1)
AlGaAs Etch (Panasonic 1)
GaN Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
SiNx Etching (Panasonic 2)
Al Etch (Panasonic 2)
GaAs Etch (Panasonic 2)
ICP-Etch (Unaxis VLR)
GaAs-AlGaAs Etch
InP-InGaAs-InAlAs Etch (Unaxis VLR)
- InP Etch Recipe (Cl2N2Ar 200C)
- InP-based Material Etch Profile (Cl2N2Ar200C)
- Unaxis InP Etch Recipe (Cl2H2 Ar 200C) Parameters
- InP-InGaAs Etch Profile (Cl2H2 Ar 200C)