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|description = Vapor HF Etcher ...Si carrier wafer) up to an 8^" wafer. There are 5 standard etch recipes installed in the tool with the SiO₂ undercut-etch-rate from low

|description = Vapor HF Etcher ...Si carrier wafer) up to an 8^" wafer. There are 5 standard etch recipes installed in the tool with the SiO₂ etch rate from low to high.

{{recipes|Dry Etching}} =[[Vapor HF Etch (uETCH)]]=

===<u>[[Process Group - Process Control Data#Etching .28Process Control Data.29|Process Control Data]]</u>=== <small>''See [[Process Group - Process Control Data#Etching .28Process Control Data.29|linked page]] for [https://en.wikipedia.org/wiki

{{recipes|Vacuum Deposition}} =Vapor Pressure Chart and Materials Deposition Table=

#**''Starting recipes (spin, bake, exposure, develop etc.) for all photolith. tools.'' #**[[Contact Alignment Recipes|<u>Contact Aligner Recipes</u>]]