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...ransistors and Template Assisted Selective Epitaxy.pdf|THz Transistors and Template Assisted Selective Epitaxy - Brian Markman - Rodwell Group - UCSB - Sept. 2

...ransistors and Template Assisted Selective Epitaxy.pdf|THz Transistors and Template Assisted Selective Epitaxy - Brian Markman}}

===[[Template:Publications|Select Publications]]===

...) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB Gain4" (measuring small particl #** (Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gain4)

...the vendor to insert your 1x (wafer-scale) design into the appropriate GCA template and they can add a barcode. ....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]

....edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal

*[[Media:GCA Stepper MaskPlate Master-DarkField 5x.gds|Photomask Template: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)]] **''This template is designed to be submitted to the photomask vendor to print as-is, no scal

*[[Media:Vernier Template.gds|Alignment/Registration Vernier Scales (GDS)]] - used to measure the mis ...t=screenshot of vernier_template.gds CAD file|none|thumb|200x200px|Vernier Template schematic.]]

Note: if you chose a “Small” substrate template, the system always moves the sample under the '''overview camera''' at firs ...Series exposure (focus-exposure matrix, FEM), you can choose the "_Manual" template during <u>Setup</u>, and on the <u>Expose</u> screen you can edit the Serie

...otech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Template Guidelines] ''- Choosing the right settings for your substrate size - CRITI

..., at wafer-scale (1X), and they'll scale it up 4x and insert it into their template.

...ed, at wafer-scale (1X), and they'll scale it up 4x and insert it into the template.

**This etch is detailed in the following article: [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru **''This etch is used in the following publication:'' [[Template:Publications#Highly Selective and Vertical Etch of Silicon Dioxide using Ru

...) and UCSBTEST2 (for scanning 4"wafers). The recipe UCSBTEST2 is used as a template to create other two standard recipes: "UCSB Gain4" (measuring small particl #**Recipe "UCSBTEST2" is used as a template to create recipes UCSB Gain2 and UCSB Gain4

|Template assisted selective epitaxy of InP via MOVPE towards horizontal heterojunct |Towards Horizontal Heterojunctions for Tunnel Field Effect transistors with Template Assisted Selective Epitaxy via MOCVD