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Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)
|description = SiRIE Based Flourine Etcher for Bosch MEMS Processes |manufacturer = Plasmatherm (Unaxis)

4 KB (603 words) - 13:09, 22 November 2023

Si Deep RIE (PlasmaTherm/Bosch Etch)
#REDIRECT [[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)]]

64 bytes (8 words) - 14:51, 28 August 2018
Tony Bosch
*[[Oxford ICP Etcher (PlasmaPro 100 Cobra)]] *[[DSEIII (PlasmaTherm/Deep Silicon Etcher)]]

851 bytes (98 words) - 09:53, 28 October 2021
Process Group - Process Control Data
==[[PECVD Recipes#PECVD 1 .28PlasmaTherm 790.29|PECVD #1 (PlasmaTherm 790)]]== ...es#Process Control Data .28Fluorine ICP Etcher.29|PlasmaTherm SLR Fluorine Etcher]]==

10 KB (1,497 words) - 12:03, 24 April 2024
Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)
|description = SiRIE Based Flourine Etcher for Bosch MEMS Processes |manufacturer = Plasmatherm (Unaxis)

4 KB (603 words) - 13:09, 22 November 2023
Tool List
*[[PECVD 1 (PlasmaTherm 790)]] *[[RIE 5 (PlasmaTherm)]]

7 KB (844 words) - 11:52, 1 March 2024
Laser Etch Monitoring
|location=ICP1, ICP2, Fluorine Etcher, DSE-iii, Oxford Cobra ...ii]] and [[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Fluorine ICP Etcher]]

8 KB (1,293 words) - 15:09, 6 December 2023
ICP Etching Recipes
=[[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)]]= ...luorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|PlasmaTherm/SLR Fluorine Etcher]]=

28 KB (4,350 words) - 17:09, 9 April 2024