Search results

Page title matches

• IR Aligner (SUSS MJB-3 IR)
  |description = Mask Aligner - MJB 3 UV400 IR ...velength and "operator technique") is down to 1 micron (hard contact). The aligner is configured for the near-UV window (365 and 405 nm). Exposures can be don
  2 KB (328 words) - 11:56, 7 August 2020

Page text matches

• IR Aligner (SUSS MJB-3 IR)
  |description = Mask Aligner - MJB 3 UV400 IR ...velength and "operator technique") is down to 1 micron (hard contact). The aligner is configured for the near-UV window (365 and 405 nm). Exposures can be don
  2 KB (328 words) - 11:56, 7 August 2020
• Suss Aligners (SUSS MJB-3)
  |description = Mask Aligner - MJB 3 UV400 ...ique") is into the submicron region. (See descriptions for our "Std." and "IR" units).
  4 KB (568 words) - 12:07, 1 March 2024
• Tool List
  *[[Suss Aligners (SUSS MJB-3)|Contact Aligners (SUSS MJB-3)]] *[[Contact Aligner (SUSS MA-6)]]
  7 KB (844 words) - 11:52, 1 March 2024
• Direct-Write Lithography Recipes
  ==[[Maskless Aligner (Heidelberg MLA150)]]== Photolithography Recipes for the [[Maskless Aligner (Heidelberg MLA150)|Heidelberg MLA150]]. All recipes were characterized on
  7 KB (917 words) - 15:04, 20 March 2024