Difference between revisions of "Wafer Bonder (SUSS SB6-8E)"

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=Documentation=
 
=Documentation=
   
*Bonder Pressure Rules Visual Aid
+
*[https://wiki.nanofab.ucsb.edu/w/images/1/12/Bonder_Pressure_Rules_Vis_Aid.docx Bonder Pressure Rules Visual Aid]
 
*[https://wiki.nanofab.ucsb.edu/w/images/5/5c/Suss_Bonder_Recipe_Guidelines.docx Bonder Recipe Guidelines]
 
*[https://wiki.nanofab.ucsb.edu/w/images/5/5c/Suss_Bonder_Recipe_Guidelines.docx Bonder Recipe Guidelines]

Latest revision as of 10:53, 20 September 2023

Wafer Bonder (SUSS SB6-8E)
WaferBonder.jpg
Location Bay 7
Tool Type Thermal Processing
Manufacturer Karl Suss America
Description Karl Suss Substrate Bonder

Primary Supervisor Aidan Hopkins
(805) 893-2343
hopkins@ece.ucsb.edu

Secondary Supervisor

Lee Sawyer


Recipes N/A

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About

This is Karl-Suss model SB-6 substrate bonder. Wafer bonding of pieces to 6” wafers can be done at pressures from 5e-5 to 3e3 mBar and from 50°C to 550°C. This tool mates with the Karl-Suss MA-6 aligner to allow for aligned bonding. Forces up to 20 kN for a 150 mm wafer size are available. The system supports thermal compression as well as anodic bonding (up to 2000 V). The system is computer controlled with a windows environment allowing for multiple recipe steps and saving of recipes and data. The system is configured for manual loading of wafers.

Detailed Specifications

  • Wafer bonding from 50°C to 550°C, +/- 5 degrees accuracy, +/- 3% uniformity
  • Upper and lower heating of samples
  • 5e-5 to 3e3 Torr environment bonding pressure, with Nitrogen
  • Sample size: pieces to 6” wafers, aligned bonding by using the MA/BA-6 aligner - contact supervisor for setup.
  • Anodic bonding to 2000 V
  • Windows-based computer control
  • Wafer bonder currently set up for 4" wafers

Documentation