Difference between revisions of "Vacuum Deposition Recipes"

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| <!-- INTENTIONALLY LEFT BLANK --> <br>
 
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! bgcolor="#D0E7FF" align="center" colspan="4" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="4" | '''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]'''
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! bgcolor="#D0E7FF" align="center" colspan="5" | '''[[Sputtering Recipes|Sputtering]]'''
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! bgcolor="#D0E7FF" align="center" colspan="6" | '''[[Sputtering Recipes|Sputtering]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[Thermal Evaporation Recipes|Thermal Evaporation]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="3" | '''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]'''
 
! width="90" bgcolor="#D0E7FF" align="center" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
 
! width="90" bgcolor="#D0E7FF" align="center" | '''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]'''
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! width="100" bgcolor="#D0E7FF" align="center" | '''[[Ion Beam Deposition Recipes|Ion Beam Deposition (IBD)]]'''
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! width="80" bgcolor="#D0E7FF" align="center" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
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! width="100" bgcolor="#D0E7FF" align="center" | '''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]'''
  
 
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! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
 
! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
 
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
 
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
 
| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal Evap 1]]
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| width="55" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
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| width="45" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
 
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
 
| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
 
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
 
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
 
| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
 
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
 
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
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| width="65" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
 
 
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
  
| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
 
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|Al2O3 deposition (ALD)}}
 
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| {{rl|Atomic Layer Deposition Recipes|AlN deposition (ALD)}}
 
 
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD)}}
 
 
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| {{rl|Ion Beam Deposition Recipes|SiN deposition (IBD)}}
 
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| {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
 
| {{rl|PECVD Recipes|SiN deposition (Unaxis VLR)}}
 
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| {{rl|Ion Beam Deposition Recipes|SiN deposition (IBD)}}
  
 
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| bgcolor="EEFFFF" | {{rl|Ion Beam Deposition Recipes|SiO2 deposition (IBD)}}
 
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| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
 
| bgcolor="EEFFFF" | {{rl|PECVD Recipes|SiO2 deposition (Unaxis VLR)}}
 
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD)}}
 
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD)}}
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| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD)}}
 
| bgcolor="EEFFFF" | {{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD)}}
 
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! bgcolor="#D0E7FF" align="center" | '''Material'''
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! width="20" bgcolor="#D0E7FF" align="center" | '''Material'''
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| bgcolor="#DAF1FF" | [[E-Beam 1 (Sharon)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]]
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| bgcolor="#DAF1FF" | [[E-Beam 2 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]]
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| bgcolor="#DAF1FF" | [[E-Beam 3 (Temescal)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]]
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| bgcolor="#DAF1FF" | [[E-Beam 4 (CHA)]]
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| width="65" bgcolor="#DAF1FF" | [[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]]
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| bgcolor="#DAF1FF" | [[Sputter 1 (Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_1_.28Custom.29|Sputter 1 (Custom)]]
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| bgcolor="#DAF1FF" | [[Sputter 2 (SFI Endeavor)|Sputter 2<br>(SFI Endeavor)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_2_.28SFI_Endeavor.29|Sputter 2<br>(SFI Endeavor)]]
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| bgcolor="#DAF1FF" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_3_.28ATC_2000-F.29|Sputter 3<br>(ATC 2000-F)]]
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| bgcolor="#DAF1FF" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_4_.28ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]]
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| bgcolor="#DAF1FF" | [[Sputter 5 (Lesker AXXIS)]]
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| width="65" bgcolor="#DAF1FF" | [[Sputtering Recipes#Sputter_5_.28Lesker_AXXIS.29|Sputter 5 (Lesker AXXIS)]]
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| bgcolor="#DAF1FF" | [[Thermal Evap 1]]
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| width="55" bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
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| bgcolor="#DAF1FF" | [[Thermal Evap 2 (Solder)]]
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| width="45" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]]
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| bgcolor="#DAF1FF" | [[PECVD 1 (PlasmaTherm 790)|PECVD 1<br>(PlasmaTherm 790)]]
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| width="65" bgcolor="#DAF1FF" | [[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]]
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| bgcolor="#DAF1FF" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]]
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| bgcolor="#DAF1FF" | [[Unaxis VLR ICP-PECVD]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]]
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| bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
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| width="65" bgcolor="#DAF1FF" | [[PECVD Recipes#Unaxis_VLR_ICP-PECVD|Unaxis VLR ICP-PECVD]]
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| bgcolor="#DAF1FF" | [[Ion Beam Deposition (Veeco NEXUS)|Ion Beam<br>Deposition (Tool)]]
+
| width="65" bgcolor="#DAF1FF" | [[Atomic Layer Deposition (Oxford FlexAL)|Atomic Layer Deposition (Tool)]]
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| bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
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| width="65" bgcolor="#DAF1FF" | [[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]]
 
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Revision as of 08:04, 7 September 2012

Vacuum Deposition Recipes

 E-Beam Evaporation Sputtering Thermal Evaporation Plasma Enhanced Chemical
Vapor Deposition (PECVD) 		Atomic Layer Deposition Molecular Vapor Deposition
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
Ag
















Al
















Al2O3














R
AlN














R
Au
















B
















Co
















Cr
















Cu
















Fe
















Ge
















Hf
















HfO2














R
In
















Ir
















ITO
















Mo
















Nb
















Ni
















Pd
















Pt
















Ru
















Si
















SiN








R

R R R

SiO2








R

R R R R
SiOxNy
















Sn
















SrF2
















Ta
















Ta2O5








R






Ti
















TiN
















TiO2
















V
















W
















Zn
















ZnO2
















Zr
















ZrO2














R
Material E-Beam 1 (Sharon) E-Beam 2 (Custom) E-Beam 3 (Temescal) E-Beam 4 (CHA) Sputter 1 (Custom) Sputter 2
(SFI Endeavor) 		Sputter 3
(ATC 2000-F) 		Sputter 4
(ATC 2200-V) 		Sputter 5 (Lesker AXXIS) Ion Beam
Deposition (Tool) 		Thermal
Evap 1 		Thermal Evap 2 (Solder) PECVD 1
(PlasmaTherm 790) 		PECVD 2
(Advanced Vacuum) 		Unaxis VLR ICP-PECVD Atomic Layer Deposition (Tool) Molecular Vapor Deposition (Tool)
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Vacuum_Deposition_Recipes&oldid=2471"