Difference between revisions of "Vacuum Deposition Recipes"
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+ | ===[[Process Group - Process Control Data#Deposition .28Process Control Data.29|<u>Process Control Data</u>]]=== |
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− | This table can be used to help located the needed recipe. |
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+ | <small>''See [[Process Group - Process Control Data#Deposition .28Process Control Data.29|linked page]] for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.''</small> |
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+ | ===Deposition Tools/Materials Table=== |
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− | = Table (This heading is temporary) = |
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+ | *<small>'''R''': ''Recipe is available. Clicking this link will take you to the recipe.''</small> |
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− | {| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" class="collapsible wikitable" |
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+ | *<small>'''A''': ''Material is available for use, but no recipes are provided.''</small> |
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− | |- bgcolor="#D0E7FF" |
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− | ! width="1675" height="45" colspan="18" | <div style="font-size: 150%;">Vacuum Deposition Recipes</div> |
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− | | <!-- INTENTIONALLY LEFT BLANK --> <br> |
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+ | ! colspan="16" width="1675" height="45" |<div style="font-size: 150%;">Vacuum Deposition Recipes</div> |
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− | ! bgcolor="#D0E7FF" align="center" colspan="4" | '''E-Beam Evaporation''' |
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+ | |- bgcolor="#d0e7ff" |
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− | ! bgcolor="#D0E7FF" align="center" colspan="5" | '''Sputtering''' |
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+ | |<!-- INTENTIONALLY LEFT BLANK --><br> |
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− | ! bgcolor="#D0E7FF" align="center" colspan="2" | '''Thermal Evaporation''' |
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+ | ! colspan="4" bgcolor="#d0e7ff" align="center" |'''[[E-Beam Evaporation Recipes|E-Beam Evaporation]]''' |
+ | ! colspan="4" |'''[[Sputtering Recipes|Sputtering]]''' |
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− | ! width="90" bgcolor="#D0E7FF" align="center" | '''Atomic Layer Deposition''' |
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− | ! |
+ | ! colspan="2" bgcolor="#d0e7ff" align="center" |'''[[Thermal Evaporation Recipes|Thermal Evaporation]]''' |
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+ | ! colspan="3" bgcolor="#d0e7ff" align="center" |'''[[PECVD Recipes|Plasma Enhanced Chemical<br>Vapor Deposition (PECVD)]]''' |
+ | ! width="90" bgcolor="#d0e7ff" align="center" |'''[[Atomic Layer Deposition Recipes|Atomic Layer Deposition]]''' |
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+ | ! width="80" bgcolor="#d0e7ff" align="center" |'''[[Molecular Vapor Deposition Recipes|Molecular Vapor Deposition]]''' |
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+ | ! width="20" bgcolor="#d0e7ff" align="center" |'''Material''' |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_3_.28AJA_ATC_2000-F.29|Sputter 3<br>(AJA ATC 2000-F)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(AJA ATC 2200-V)]] |
+ | | width="65" bgcolor="#daf1ff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_5_.28AJA_ATC_2200-V.29 Sputter 5 (AJA ATC 2200-V)] |
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− | | width="75" | [[Sputter 3 (ATC 2000-F)|Sputter 3<br>(ATC 2000-F)]] |
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+ | | width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
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− | | width="75" | [[Sputter 4 (ATC 2200-V)|Sputter 4<br>(ATC 2200-V)]] |
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+ | | width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
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− | | width="85" | [[Sputter 5 (Lesker AXXIS)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]] |
+ | | width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]] |
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− | | width="65" | [[Thermal 2]] |
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+ | | width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]] |
+ | | width="65" bgcolor="#daf1ff" |[[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]] |
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− | | width="115" | [[PECVD 2 (Advanced Vacuum)|PECVD 2<br>(Advanced Vacuum)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAL)]] |
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− | | width="75" | [[Unaxis VLR ICP-PECVD]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]] |
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+ | |<br> |
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+ | |<br> |
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+ | |[[Sputtering Recipes|A]] |
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+ | |[[Sputtering Recipes|A]] |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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+ | |{{rl|Atomic Layer Deposition Recipes|HfO2 deposition (ALD CHAMBER 3)}} |
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+ | |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]] |
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+ | |{{Al/E1}} |
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+ | ! bgcolor="#d0e7ff" align="center" |ITO |
+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{rl|E-Beam Evaporation Recipes|E-Beam 2 (Custom)|ITO deposition (E-Beam 2)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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+ | |[[Sputtering Recipes|A]] |
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+ | |[[Sputtering Recipes|A]] |
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+ | ! bgcolor="#d0e7ff" align="center" |Mo |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{Al/E1}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Sputtering Recipes|R]] |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
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− | | bgcolor="EEFFFF" | |
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|- |
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+ | ! bgcolor="#d0e7ff" align="center" |Nb |
+ | |{{Al/E1}} |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |[[Sputtering Recipes|R]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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− | | [[Vacuum Deposition Recipes#SiN_deposition_.28PECVD_.231.29|Y]] |
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+ | |<br> |
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− | | [[Vacuum Deposition Recipes#SiN deposition (PECVD #2)|Y]] |
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+ | |<br> |
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+ | ! bgcolor="#d0e7ff" align="center" |Nd |
+ | | |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |[[Sputtering Recipes|A]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | [[Vacuum Deposition Recipes#SiO2 deposition (PECVD #1)|Y]] |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | [[Vacuum Deposition Recipes#SiO2 deposition (PECVD #2)|Y]] |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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|- |
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− | ! |
+ | ! bgcolor="#d0e7ff" align="center" |Ni |
+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{Al/E3}} |
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+ | | bgcolor="#eeffff" |{{Al/E4}} |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]] |
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+ | | bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | ! bgcolor="#d0e7ff" align="center" |NiCr |
+ | |{{Al/E1}} |
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+ | | |
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+ | |{{Al/E4}} |
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− | | bgcolor="EEFFFF" | |
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|- |
|- |
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− | ! |
+ | ! bgcolor="#d0e7ff" align="center" |NiFe |
+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" | |
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+ | | bgcolor="#eeffff" | |
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+ | | bgcolor="#eeffff" |{{Al/E4}} |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" | |
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+ | | bgcolor="#eeffff" | |
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− | ! |
+ | ! bgcolor="#d0e7ff" align="center" |Pd |
+ | |{{Al/E1}} |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |{{Al/E3}} |
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+ | |{{Al/E4}} |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |[[Thermal Evaporation Recipes|A]] |
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− | | bgcolor="EEFFFF" | |
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+ | |[[Thermal Evaporation Recipes|A]] |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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− | | bgcolor="EEFFFF" | |
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− | | bgcolor="EEFFFF" | |
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|- |
|- |
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− | ! |
+ | ! bgcolor="#d0e7ff" align="center" |Pt |
+ | | bgcolor="#eeffff" |{{Al/E1}} |
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− | | |
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+ | | bgcolor="#eeffff" |<br> |
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− | | |
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+ | | bgcolor="#eeffff" |{{Al/E3}} |
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− | | |
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+ | | bgcolor="#eeffff" |{{Al/E4}} |
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− | | |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}} |
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+ | | bcolor="EEFFFF" |{{rl|Sputtering Recipes|Sputter 5 (AJA ATC 2200-V)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|Pt deposition (ALD CHAMBER 1)}} |
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+ | | bgcolor="#eeffff" |<br> |
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− | | |
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− | | |
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|- |
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+ | ! bgcolor="#d0e7ff" align="center" |Ru |
+ | |{{Al/E1}} |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |{{Al/E4}} |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |[[Sputtering Recipes#Ru Deposition .28Sputter 4.29|R]] |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |{{rl|Atomic Layer Deposition Recipes|Ru deposition (ALD CHAMBER 1)}} |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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− | | bgcolor="EEFFFF" | |
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− | | bgcolor="EEFFFF" | |
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|- |
|- |
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− | ! |
+ | ! bgcolor="#d0e7ff" align="center" |Si |
+ | | bgcolor="#eeffff" |<br> |
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− | | |
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+ | | bgcolor="#eeffff" |{{Al/E2}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|R]] |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[https://wiki.nanotech.ucsb.edu/w/index.php?title=PECVD_Recipes#Amorphous-Si_deposition_.28PECVD_.232.29 R] |
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+ | |<br> |
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+ | |<br> |
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+ | |{{rl|Sputtering Recipes|SiN deposition (Sputter 3)}} |
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+ | |[[Sputtering Recipes|A]] |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |[[Sputtering_Recipes#Si3N4_deposition_.28IBD.29|R]] |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |<br> |
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− | | bgcolor="EEFFFF" | |
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+ | |{{rl|PECVD Recipes|SiN deposition (PECVD #1)}} |
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− | | bgcolor="EEFFFF" | |
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+ | |{{rl|PECVD Recipes|SiN deposition (PECVD #2)}} |
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− | | bgcolor="EEFFFF" | |
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+ | |{{rl|PECVD Recipes|SiN 250C deposition (Unaxis VLR)}} |
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+ | ! bgcolor="#d0e7ff" align="center" |SiN - Low Stress |
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+ | |{{rl|PECVD Recipes|Low-Stress SiN - LS-SiN (PECVD#1)}} |
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+ | |{{rl|PECVD Recipes|Low-Stress SiN deposition (PECVD #2)}} |
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+ | |{{rl|PECVD Recipes|SiN LS 250C Deposition (Unaxis VLR)}} |
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+ | ! bgcolor="#d0e7ff" align="center" |SiO<sub>2</sub> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" |{{Al/E2}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|SiO2 deposition (Sputter 3)}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
+ | | bgcolor="#eeffff" |[[Sputtering_Recipes#SiO2_deposition_.28IBD.29|R]] |
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− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #1)}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 deposition (PECVD #2)}} |
+ | | bgcolor="#eeffff" |{{rl|PECVD Recipes|SiO2 LDR 250C Deposition (Unaxis VLR)}} |
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− | | bgcolor="EEFFFF" | |
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+ | | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|SiO2 deposition (ALD CHAMBER 3)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | ! bgcolor="#d0e7ff" align="center" |SiO<sub>x</sub>N<sub>y</sub> |
+ | |<br> |
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+ | |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#SiOxNy_deposition_.28IBD.29 R] |
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+ | |<br> |
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+ | |<br> |
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+ | |[[PECVD_Recipes#PECVD_1_.28PlasmaTherm_790.29|R]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Thermal Evaporation Recipes|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | ! bgcolor="#d0e7ff" align="center" |SrF<sub>2</sub> |
+ | |<br> |
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+ | |{{Al/E2}} |
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+ | ! bgcolor="#d0e7ff" align="center" |Ta |
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+ | | bgcolor="#eeffff" |{{Al/E1}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ta deposition (Sputter 3)}} |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
+ | | bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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− | | bgcolor=" |
+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
+ | |- |
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− | | bgcolor="EEFFFF" | |
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− | + | ! bgcolor="#d0e7ff" align="center" |Ta<sub>2</sub>O<sub>5</sub> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |{{Al/E2}} |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |[[Sputtering_Recipes#Ta2O5_deposition_.28IBD.29|R]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |Ti |
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+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{Al/E3}} |
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+ | | bgcolor="#eeffff" |{{Al/E4}} |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 3 (AJA ATC 2000-F)}} |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Ti-Au Deposition (Sputter 4)}} |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 5 (AJA ATC 2200-V)}} |
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+ | | bgcolor="#eeffff" |<br>[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |TiN |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |[https://wiki.nanotech.ucsb.edu/w/index.php?title=Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29 R] |
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+ | |<br> |
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+ | |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|A]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |{{rl|Atomic Layer Deposition Recipes|TiN deposition (ALD CHAMBER 3)}} |
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+ | |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |TiW |
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+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|W-TiW Deposition (Sputter 4)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |TiO<sub>2</sub> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{Al/E2}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|Sputter 4 (AJA ATC 2200-V)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering_Recipes#TiO2_deposition_.28IBD.29|R]] |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|TiO2 deposition (ALD CHAMBER 3)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |V |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |[[Sputtering Recipes|A]] |
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+ | |[[Sputtering Recipes|A]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |W |
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+ | | bgcolor="#eeffff" |{{Al/E1}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |[[Sputtering Recipes|A]] |
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+ | | bgcolor="#eeffff" |{{rl|Sputtering Recipes|W deposition (Sputter 4)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |Zn |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |[[Thermal Evaporation Recipes|A]] |
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+ | |[[Thermal Evaporation Recipes|A]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |ZnO |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZnO:Al deposition (ALD CHAMBER 1)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |Zr |
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+ | |{{Al/E1}} |
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+ | |<br> |
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+ | |<br> |
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+ | |{{Al/E4}} |
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+ | |[[Sputtering Recipes|A]] |
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+ | |[[Sputtering Recipes|A]] |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |<br> |
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+ | |- |
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+ | ! bgcolor="#d0e7ff" align="center" |ZrO<sub>2</sub> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |<br> |
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+ | | bgcolor="#eeffff" |{{rl|Atomic Layer Deposition Recipes|ZrO2 deposition (ALD CHAMBER 3)}} |
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+ | | bgcolor="#eeffff" |<br> |
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+ | |- |
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+ | ! width="20" bgcolor="#d0e7ff" align="center" |'''Material''' |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_1_.28Sharon.29|E-Beam 1 (Sharon)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_2_.28Custom.29|E-Beam 2 (Custom)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_3_.28Temescal.29|E-Beam 3 (Temescal)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[E-Beam Evaporation Recipes#E-Beam_4_.28CHA.29|E-Beam 4 (CHA)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Sputtering Recipes#Sputter_3_.28ATC_2000-F.29|Sputter 3<br>(ATC 2000-F)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Sputtering_Recipes#Sputter_4_.28AJA_ATC_2200-V.29|Sputter 4<br>(ATC 2200-V)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Sputtering Recipes|Sputter 5 (ATC 2200-V)]] |
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+ | | width="55" bgcolor="#daf1ff" |[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29|Ion Beam<br>Deposition (Veeco Nexus)]] |
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+ | | width="45" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_1|Thermal<br>Evap 1]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Thermal Evaporation Recipes#Thermal_Evap_2_.28Solder.29|Thermal Evap 2 (Solder)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_1_.28PlasmaTherm_790.29|PECVD 1<br>(PlasmaTherm 790)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[PECVD Recipes#PECVD_2_.28Advanced_Vacuum.29|PECVD 2<br>(Advanced Vacuum)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[PECVD_Recipes#ICP-PECVD_.28Unaxis_VLR.29|Unaxis VLR ICP-PECVD]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Atomic_Layer_Deposition_Recipes|Atomic Layer Deposition (Oxford FlexAl)]] |
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+ | | width="65" bgcolor="#daf1ff" |[[Molecular Vapor Deposition|Molecular Vapor Deposition (Tool)]] |
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|} |
|} |
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+ | [[Category:Processing]] |
||
− | = E-Beam Evaporation = |
||
− | |||
− | == Recipe 1 == |
||
− | |||
− | #Step 1 .... |
||
− | #Step 2... |
||
− | |||
− | == Recipe 2 == |
||
− | |||
− | = Sputtering = |
||
− | |||
− | = Thermal Evaporation = |
||
− | |||
− | = Plasma Enhanced Chemical Vapor Deposition (PECVD) = |
||
− | |||
− | == SiN deposition (PECVD #1) == |
||
− | |||
− | #'''Clean''' (30CLN_SN) |
||
− | ##Initial t=10", p=2x10-2, T=250C |
||
− | ##N<sub>2</sub> Purge t=30", p=300mT |
||
− | ##evacuate, base pressure=2x10-2, t=10" |
||
− | ##loop |
||
− | ##gas stabilization, t=30" |
||
− | ##etch chamber, t=30' |
||
− | ##evacuate, t=10" |
||
− | ##N<sub>2</sub> purge |
||
− | ##evacuate |
||
− | ##loop |
||
− | ##SiN gas stabilization |
||
− | ##SiN deposition( 200A coat) |
||
− | ##evacuate |
||
− | ##N<sub>2</sub> purge, t=30" |
||
− | ##end |
||
− | #'''SiN deposition''' (SiN_10) 130.8 A/min |
||
− | ##Initial t=10" |
||
− | ##N<sub>2</sub> purge t=30" |
||
− | ##evacuate, t=10" |
||
− | ##loop |
||
− | ##SiN gas stabilization, t=30" |
||
− | ##SiN deposition t=8'11.2" |
||
− | ##evacuate, t=10" |
||
− | ##N<sub>2</sub> purge t=30" |
||
− | ##evacuate t=10" |
||
− | ##loop |
||
− | == SiO<sub>2</sub> deposition (PECVD #1) == |
||
− | |||
− | #'''Clean''' (30CLN_SN) |
||
− | ##Initial t=10", p=2x10-2, T=250C |
||
− | ##N<sub>2</sub> Purge t=30", p=300mT |
||
− | ##evacuate, base pressure=2x10-2, t=10" |
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− | ##loop |
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− | ##gas stabilization, t=30" |
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− | ##etch chamber, t=30' |
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− | ##evacuate, t=10" |
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− | ##N<sub>2</sub> purge |
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− | ##evacuate |
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− | ##loop |
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− | ##SiO<sub>2</sub> gas stabilization |
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− | ##SiO<sub>2</sub> deposition( 200A coat) |
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− | ##evacuate |
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− | ##N<sub>2</sub> purge, t=30" |
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− | ##end |
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− | #'''SiO<sub>2</sub> deposition''' (SiO2_10) 440.5 A/min |
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− | ##Initial t=10" |
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− | ##N<sub>2</sub> purge t=30" |
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− | ##evacuate, t=10" |
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− | ##loop |
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− | ##SiO<sub>2</sub> gas stabilization, t=30" |
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− | ##SiO<sub>2</sub> deposition t=8'11.2" |
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− | ##evacuate, t=10" |
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− | ##N<sub>2</sub> purge t=30" |
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− | ##evacuate t=10" |
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− | ##loop |
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− | |||
− | == SiN deposition (PECVD #2) == |
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− | |||
− | #'''Standard clean''' |
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− | ##'''Pump down''': stabilization time t=15", step time(m)=0', step time(s)=30" |
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− | ##'''Pre-purge''': purge=1, stabilization time=15, step time(m)=1, step time(sec)=0 |
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− | ##'''High Pressure''': process pressure=600, RF point=300, stabilization time=35, step time(m)=30, step time(s)=0, CF4/O2(5)=500 |
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− | ##'''Low pressure''': process pressure=300, RF setpoint=300, stabilization time=15, step time(m)=30, step time(s)=0, CF4/O2(5)=500 |
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− | #'''Nitride 2''' (HF, n=2.0, 93nm/min) |
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− | ##process pressure=800, RF setpoint=30, stabilization time=15, step time(m)=10, step time(s)=0, 2%SiH4%He(1)=1040, N2(3)=980, NH3(2)=17 |
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− | |||
− | == SiO<sub>2</sub> deposition (PECVD #2) == |
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− | |||
− | #'''Standard clean''' |
||
− | ##'''Pump down''': stabilization time t=15", step time(m)=0', step time(s)=30" |
||
− | ##'''Pre-purge''': purge=1, stabilization time=15, step time(m)=1, step time(sec)=0 |
||
− | ##'''High Pressure''': process pressure=600, RF point=300, stabilization time=35, step time(m)=30, step time(s)=0, CF4/O2(5)=500 |
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− | ##'''Low pressure''': process pressure=300, RF setpoint=300, stabilization time=15, step time(m)=30, step time(s)=0, CF4/O2(5)=500 |
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− | #'''Oxide''' (HF, n=1.46, 25nm/min) |
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− | ##process pressure=800, RF setpoint=30, stabilization time=15, step time(m)=10, step time(s)=0, 2%SiH4%He(1)=600, N2O(4)=1420 |
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− | |||
− | = Atomic Layer Deposition (ALD) = |
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− | |||
− | = Ion-Beam Deposition (IBD) = |
||
− | |||
− | = Molecular Vapor Deposition (MVD) = |
Latest revision as of 15:44, 7 July 2022
Process Control Data
See linked page for process control data (calibration data over time, such as dep. rate, refractive index, stress etc.) over time, for a selection of highly used tools/films.
Deposition Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.