Difference between revisions of "Vacuum Deposition Recipes"

Revision as of 11:21, 7 September 2012

Y = Recipe, A = Avaliable

Vacuum Deposition Recipes
	E-Beam Evaporation				Sputtering						Thermal Evaporation		Plasma Enhanced Chemical Vapor Deposition (PECVD)			Atomic Layer Deposition	Molecular Vapor Deposition
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Tool)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Molecular Vapor Deposition (Tool)
Ag	A		A	A
Al	A		A	A
Al₂O₃	A	A														R
AlN																R
Au	A		A	A
B
Co				A
Cr				A
Cu
Fe				A
Ge	A		A	A
GeO₂		A
Hf				A
HfO₂																R
In
Ir				A
ITO		A
MgO		A
Mo
Nb
Ni	A		A	A
NiCr				A
NiFe				A
Pd	A		A	A
Pt	A		A	A
Ru				A
Si		A	A
SiN	A									R			R	R	R
SiO₂		A								R			R	R	R	R
SiO_xN_y		A
Sn
SrF₂		A
Ta
Ta₂O₅				A						R
Ti	A		A	A
TiN
TiO₂		A
V
W
Zn
ZnO₂
Zr				A
ZrO₂																R
Material	E-Beam 1 (Sharon)	E-Beam 2 (Custom)	E-Beam 3 (Temescal)	E-Beam 4 (CHA)	Sputter 1 (Custom)	Sputter 2 (SFI Endeavor)	Sputter 3 (ATC 2000-F)	Sputter 4 (ATC 2200-V)	Sputter 5 (Lesker AXXIS)	Ion Beam Deposition (Tool)	Thermal Evap 1	Thermal Evap 2 (Solder)	PECVD 1 (PlasmaTherm 790)	PECVD 2 (Advanced Vacuum)	Unaxis VLR ICP-PECVD	Atomic Layer Deposition (Tool)	Molecular Vapor Deposition (Tool)

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