Difference between revisions of "Tube Furnace (Tystar 8300)"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 17: Line 17:
  
 
The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system.  Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.
 
The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system.  Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.
 
Under the “ambient” variable use the following:<br>
 
*Wet – 0.945
 
*Dry – 1.298
 
These numbers will give accurate growth calculations.
 
  
 
=See Also=
 
=See Also=
 
*[http://www.tystar.com/ Tystar] - Manufacturer of the tool
 
*[http://www.tystar.com/ Tystar] - Manufacturer of the tool
 
*[http://www.cleanroom.byu.edu/OxideTimeCalc.phtml Silicon Thermal Oxide Thickness Calculator] - Use this on-line calculator to calculate times for silicon oxidation.
 
*[http://www.cleanroom.byu.edu/OxideTimeCalc.phtml Silicon Thermal Oxide Thickness Calculator] - Use this on-line calculator to calculate times for silicon oxidation.

Revision as of 10:13, 28 June 2012

Tube Furnace (Tystar 8300)
Tystar.jpg
Tool Type Thermal Processing
Location Bay 3
Supervisor Tony Bosch
Supervisor Phone (805) 893-3486
Supervisor E-Mail bosch@ece.ucsb.edu
Description Tystar 8" 3-Tube Oxidation/Annealing System
Manufacturer Tystar Corporation


About

The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for one tube each:

  1. Dry or wet oxidation of silicon - Tubes 2 and 3
  2. SOG curing - Tube 1
  3. General furnace annealing - Tube 3

The tubes can hold up to one hundred 8” wafers per tube per cycle. We have boats for various wafer sizes, including pieces. The maximum temperature is 1050°C for the system. Gases used are O2, Steam from DI-H2O, N2.

See Also