Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Florine etch of the underneath layer)"
(add a SEM pic) (Tag: Visual edit) |
(Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/") |
||
Line 15: | Line 15: | ||
|0.63 |
|0.63 |
||
| |
| |
||
− | |[https:// |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/3/33/I11902.pdf] |
|- |
|- |
||
|5/29/2019 |
|5/29/2019 |
||
Line 22: | Line 22: | ||
|0.58 |
|0.58 |
||
| |
| |
||
− | |[https:// |
+ | |[https://wiki.nanotech.ucsb.edu/wiki/images/b/bc/I11904.pdf] |
|} |
|} |