News from the U.C. Santa Barbara Nanofabrication Facility.
New Deep Silicon Etcher Online
The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.
2016 Survey Results
See the May 2016 User Survey Results.
-- Brian Thibeault 12:00, 01 May 2016 (PST)
CAIBE Ion Mill Available
12:00, 01 July 2015 (PST)
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details.
-- Brian Thibeault 12:00, 07 July 2013 (PST)