Difference between revisions of "Template:News"
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News from the U.C. Santa Barbara Nanofabrication Facility | News from the U.C. Santa Barbara Nanofabrication Facility | ||
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'''How to add new news items''' | '''How to add new news items''' | ||
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* Each item should finish with the user signature (four tildes: <nowiki>~~~~</nowiki>). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end. | * Each item should finish with the user signature (four tildes: <nowiki>~~~~</nowiki>). When you 'Save' the page, this will be replaced with a timestamp and your user name. The timestamp determines the order of items in the feed - items without a timestamp show up at the end. | ||
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= New Deep Silicon Etcher Online = | = New Deep Silicon Etcher Online = | ||
| − | The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) | + | The new [[DSEIII_(PlasmaTherm/Deep_Silicon_Etcher)|Plasma-Therm Versaline DSE III DRIE etcher]] has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. |
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| + | [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST) | ||
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= 2016 Survey Results = | = 2016 Survey Results = | ||
| − | See the May 2016 {{file|Survey052016.pdf| User Survey Results}}. [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 May 2016 (PST) | + | See the May 2016 {{file|Survey052016.pdf| User Survey Results}}. |
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| + | [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 May 2016 (PST) | ||
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= CAIBE Ion Mill Available = | = CAIBE Ion Mill Available = | ||
| − | The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 July 2015 (PST) | + | The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. |
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| + | [[User:Thibeault|-- Brian Thibeault]] 12:00, 01 July 2015 (PST) | ||
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= NanoFiles SFTP Online = | = NanoFiles SFTP Online = | ||
| − | Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. [[User:Thibeault|-- Brian Thibeault]] 12:00, 07 July 2013 (PST) | + | Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. |
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| + | [[User:Thibeault|-- Brian Thibeault]] 12:00, 07 July 2013 (PST) | ||
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Revision as of 00:26, 28 November 2017
News from the U.C. Santa Barbara Nanofabrication Facility
New Deep Silicon Etcher Online
The new Plasma-Therm Versaline DSE III DRIE etcher has been qualified for bosch etch and single-step etches, and is available for use. The new tool features much higher silicon etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer.
-- Demis (talk) 22:16, 27 November 2017 (PST)
2016 Survey Results
See the May 2016 User Survey Results.
-- Brian Thibeault 12:00, 01 May 2016 (PST)
CAIBE Ion Mill Available
The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information.
-- Brian Thibeault 12:00, 01 July 2015 (PST)
NanoFiles SFTP Online
Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details.
-- Brian Thibeault 12:00, 07 July 2013 (PST)