Difference between revisions of "Spin Rinse Dryer (SemiTool)"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
(Created page with "{{tool|{{PAGENAME}} |picture=SpinRinse.jpg |type = Wet Processing |super= Don Freeborn |location=Bay 7 |description = ? |manufacturer = SemiTool }}")
 
(added description + capabilities,)
Line 1: Line 1:
 +
Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
 +
 +
Each has a dedicated cassette that can hold up to 25 wafers.
 +
 +
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm.  A "Dry Only" option is also available.
 +
 
{{tool|{{PAGENAME}}
 
{{tool|{{PAGENAME}}
 
|picture=SpinRinse.jpg
 
|picture=SpinRinse.jpg

Revision as of 16:13, 7 September 2017

Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

Each has a dedicated cassette that can hold up to 25 wafers.

The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.

Spin Rinse Dryer (SemiTool)
SpinRinse.jpg
Tool Type Wet Processing
Location Bay 7
Supervisor Don Freeborn
Supervisor Phone (805) 893-7975
Supervisor E-Mail dfreeborn@ece.ucsb.edu
Description ?
Manufacturer SemiTool