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Showing below up to 250 results in range #201 to #450.
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- Suss MA6 SOP4.pdf ; 44 KB
- Suss MJB3 SOP1.pdf ; 88 KB
- Tystar Operational Procedure.pdf ; 213 KB
- Vapor-Pressure-Chart.xlsx ; 266 KB
- PECVD1-SiN-standard recipe.pdf ; 189 KB
- PECVD1-SiN Data-March 2014.pdf ; 101 KB
- SiO2 100% SiH4 HDR 50C.pdf ; 42 KB
- PECVD1-SiN-standard recipe 1000A.pdf ; 295 KB
- PECVD1-SiN-1000A Standard recipe.pdf ; 296 KB
- ALD operating instructions-1.pdf ; 66 KB
- PECVD1-SiO2-standard recipe 1000A.pdf ; 1,007 KB
- Operating Ebeam1-2.pdf ; 130 KB
- ADV. PECVD OXIDE data-March 2014.pdf ; 105 KB
- New Operating Instructions Ebeam.pdf ; 169 KB
- IBD SiO2 Standard Recipe.pdf ; 57 KB
- New IBD SiO2 Standard Recipe.pdf ; 57 KB
- IBD SiO2 Data March 2014.pdf ; 118 KB
- ASML Job Set-Up Guide.pdf ; 3.13 MB
- IBD SiNdeposition.pdf ; 59 KB
- IBD SiN Data March 2014.pdf ; 121 KB
- IBD Ta2O5 deposition details.pdf ; 57 KB
- IBD Ta2O5 Data March 2014.pdf ; 121 KB
- IBD TiO2 Data March 2014.pdf ; 119 KB
- New IBD TiO2 deposition.pdf ; 0 bytes
- ADV OXIDE data April 2014.pdf ; 106 KB
- Adv PECVD LS NITRIDE2 April 2014.pdf ; 122 KB
- IBD SiN Data April 2014.pdf ; 122 KB
- New IBD SiN Data April 2014.pdf ; 0 bytes
- IBD Ta2O5 Data April 2014.pdf ; 121 KB
- New IBD TiO2 Data April 2014.pdf ; 0 bytes
- PECVD1-SiN-standard recipe 2014.pdf ; 298 KB
- PECVD1-SiO2-standard recipe 2014.pdf ; 299 KB
- 29-UnaxisPM3-SiO2-SiH4-O2-He.pdf ; 88 KB
- RIE.pdf ; 44 KB
- RIE -5 operating instructions.pdf ; 0 bytes
- Changing N2 to He.pdf ; 29 KB
- Dirty platen photos.pdf ; 2.65 MB
- PECVD1-LS SION recipe 2014.pdf ; 1.24 MB
- PECVD1-LS SIN recipe 2014.pdf ; 1.03 MB
- PECVD1-SiN standard recipe 2014.pdf ; 299 KB
- Sputter-2-AlN-Endeavor-rev1.pdf ; 89 KB
- Ti-Au-Sputtering-Films-AJA2-rev1.pdf ; 275 KB
- ASML Mask Making Guidelines.pdf ; 176 KB
- ASML Job Set-Up Guide v2.pdf ; 1.81 MB
- Cluster operating instructions.pdf ; 423 KB
- Ion Beam Etch Overview rev1.pdf ; 441 KB
- 46-Mo Film using Sputter3.pdf ; 143 KB
- LabRules2015.pdf ; 156 KB
- 47-Photolithography of SU8-2005.pdf ; 1.55 MB
- 48-Photolithography of SU8-2010.pdf ; 360 KB
- 50-InP Etch-2-17-2016.pdf ; 842 KB
- Surfscan-Surfscan 6200 info.pdf ; 114 KB
- ASML Job Set-Up Guide simple v1.pdf ; 1.6 MB
- 10-Si Etch Bosch Release DRIE.pdf ; 533 KB
- ZnS Plasma Etch-1.pdf ; 668 KB
- InGaAsSb etch.pdf ; 47 KB
- SiO2-Etch-Recipe-using-RIE-3-a.pdf ; 283 KB
- 51-SiNx-Etch-Recipe-using-RIE3.pdf ; 1.07 MB
- Sputter5 SiO2 2017 SiO2 film.pdf ; 86 KB
- Thermal evaporator 2 Sheet1.pdf ; 31 KB
- Thermal evaporator 2.pdf ; 20 KB
- Pt-Sputter4-3mT-50W-360s.pdf ; 722 KB
- Pt-Sputter4.pdf ; 1.21 MB
- TiW-Sputter4-4.5mT-300W-300s.pdf ; 957 KB
- Au-Sputter4-5mT-200W-120s.pdf ; 688 KB
- Al-Sputter4-5mT-200W-30m.pdf ; 229 KB
- Arrowleft1.jpeg 225 × 225; 2 KB
- SiNx Films by PECVD2.pdf ; 125 KB
- TiO2 film using Sputter4.pdf ; 1.45 MB
- 10-Si Etch Bosch DSEIII.pdf ; 616 KB
- Testtt.jpeg 1,024 × 1,024; 77 KB
- Sputter 3 - height conversion v1.PNG 937 × 539; 26 KB
- Toppan UCSB quotation 041116.pdf ; 316 KB
- Cu Film using Sputter-3.pdf ; 153 KB
- Home Feed - ResearchGate.pdf ; 1.89 MB
- AZ NMP RINSE MSDS.pdf ; 285 KB
- UV Ozone Manual Jelight M-144AX.pdf ; 347 KB
- Test.pdf ; 8 KB
- Process Notes for Users.pdf ; 871 KB
- VeecoNanoman.jpg 1,024 × 682; 158 KB
- IP180909.pdf ; 59 KB
- STD LSNitride2 12-14-18 recipe.pdf ; 349 KB
- 18.pdf ; 400 KB
- STD LSNitride2 5-9-18.pdf ; 400 KB
- STD Nitride 5-9-18.pdf ; 209 KB
- STD Nitride 5-9-18 Dep.recipe.pdf ; 209 KB
- STD Oxide 5-9-18 Dep.recipe.pdf ; 238 KB
- STD SiO2 5-9-18.pdf ; 239 KB
- User Percentages by Discipline 2018.png 797 × 873; 61 KB
- SiO2 Etch using ICP2-no O2-a.pdf ; 55 KB
- I11902.pdf ; 47 KB
- I11901.pdf ; 49 KB
- SiO2 Etch using ICP2 with O2.pdf ; 264 KB
- SiO2 Etch using ICP2-no O2.pdf ; 414 KB
- IP180805.pdf ; 49 KB
- IP180705.pdf ; 52 KB
- IP180606.pdf ; 62 KB
- IP180508.pptx ; 377 KB
- IP180508.pdf ; 67 KB
- IP180406.pdf ; 52 KB
- IP180304.pdf ; 63 KB
- IP180207.pdf ; 50 KB
- IP180104.pdf ; 52 KB
- ASML On Wafer Mark.gds ; 4 KB
- IP190101.pdf ; 55 KB
- IP190103.pdf ; 62 KB
- InP Etch using Unaxis PM1 at 200 C-5.pdf ; 1.87 MB
- IP170106.pdf ; 51 KB
- IP170208.pdf ; 51 KB
- IP170302.pdf ; 67 KB
- IP170404.pdf ; 56 KB
- IP170505.pdf ; 49 KB
- IP170603.pdf ; 56 KB
- IP170706.pdf ; 43 KB
- IP172520.pdf ; 59 KB
- IP172805.pdf ; 56 KB
- IP172905.pdf ; 62 KB
- IP173009.pdf ; 55 KB
- IP173107.pdf ; 54 KB
- IP173203.pdf ; 43 KB
- IP173306.pdf ; 41 KB
- IP161332.pdf ; 51 KB
- IP161421.pdf ; 55 KB
- IP161510.pdf ; 61 KB
- SLR - SiVertHF.pdf ; 300 KB
- 104 Ta Etch.pdf ; 257 KB
- Lab Rules - 7.2.1 container labelling.png 168 × 224; 68 KB
- UCSBTEST2 - gain4 for (0.160-1.60)um particles.png 1,105 × 765; 1.45 MB
- UCSBTEST.png 1,192 × 842; 1.69 MB
- UCSBTEST2 for small particles.png 1,090 × 775; 1.45 MB
- Profim3D System Photo.png 4,032 × 3,024; 14.64 MB
- Filmetrics Profilm3D System Photo.png 4,032 × 3,024; 14.64 MB
- HP 3466A DMM.png 3,998 × 1,676; 5.6 MB
- I11903.pdf ; 37 KB
- I11904.pdf ; 44 KB
- I2190506.pdf ; 59 KB
- I2190605.pdf ; 32 KB
- EVG Plasma Activation SOP.pdf ; 550 KB