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Showing below up to 100 results in range #301 to #400.
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- ASML Mask Making Guidelines.pdf ; 176 KB
- ASML Job Set-Up Guide v2.pdf ; 1.81 MB
- Cluster operating instructions.pdf ; 423 KB
- Ion Beam Etch Overview rev1.pdf ; 441 KB
- 46-Mo Film using Sputter3.pdf ; 143 KB
- LabRules2015.pdf ; 156 KB
- 47-Photolithography of SU8-2005.pdf ; 1.55 MB
- 48-Photolithography of SU8-2010.pdf ; 360 KB
- 50-InP Etch-2-17-2016.pdf ; 842 KB
- Surfscan-Surfscan 6200 info.pdf ; 114 KB
- ASML Job Set-Up Guide simple v1.pdf ; 1.6 MB
- 10-Si Etch Bosch Release DRIE.pdf ; 533 KB
- ZnS Plasma Etch-1.pdf ; 668 KB
- InGaAsSb etch.pdf ; 47 KB
- SiO2-Etch-Recipe-using-RIE-3-a.pdf ; 283 KB
- 51-SiNx-Etch-Recipe-using-RIE3.pdf ; 1.07 MB
- Sputter5 SiO2 2017 SiO2 film.pdf ; 86 KB
- Thermal evaporator 2 Sheet1.pdf ; 31 KB
- Thermal evaporator 2.pdf ; 20 KB
- Pt-Sputter4-3mT-50W-360s.pdf ; 722 KB
- Pt-Sputter4.pdf ; 1.21 MB
- TiW-Sputter4-4.5mT-300W-300s.pdf ; 957 KB
- Au-Sputter4-5mT-200W-120s.pdf ; 688 KB
- Al-Sputter4-5mT-200W-30m.pdf ; 229 KB
- Arrowleft1.jpeg 225 × 225; 2 KB
- SiNx Films by PECVD2.pdf ; 125 KB
- TiO2 film using Sputter4.pdf ; 1.45 MB
- 10-Si Etch Bosch DSEIII.pdf ; 616 KB
- Testtt.jpeg 1,024 × 1,024; 77 KB
- Sputter 3 - height conversion v1.PNG 937 × 539; 26 KB
- Toppan UCSB quotation 041116.pdf ; 316 KB
- Cu Film using Sputter-3.pdf ; 153 KB
- Home Feed - ResearchGate.pdf ; 1.89 MB
- AZ NMP RINSE MSDS.pdf ; 285 KB
- UV Ozone Manual Jelight M-144AX.pdf ; 347 KB
- Test.pdf ; 8 KB
- Process Notes for Users.pdf ; 871 KB
- VeecoNanoman.jpg 1,024 × 682; 158 KB
- IP180909.pdf ; 59 KB
- STD LSNitride2 12-14-18 recipe.pdf ; 349 KB
- 18.pdf ; 400 KB
- STD LSNitride2 5-9-18.pdf ; 400 KB
- STD Nitride 5-9-18.pdf ; 209 KB
- STD Nitride 5-9-18 Dep.recipe.pdf ; 209 KB
- STD Oxide 5-9-18 Dep.recipe.pdf ; 238 KB
- STD SiO2 5-9-18.pdf ; 239 KB
- User Percentages by Discipline 2018.png 797 × 873; 61 KB
- SiO2 Etch using ICP2-no O2-a.pdf ; 55 KB
- I11902.pdf ; 47 KB