Search results

Jump to navigation Jump to search

  • ICP Etching Recipes
    ==Edge-Bead Removal (DSEiii)== ...sure to remove photoresist from edges of wafer, or PR may stick to the top-side wafer clamp and destroy your wafer during unload!
    28 KB (4,356 words) - 12:49, 7 May 2024
Retrieved from "https://wiki.nanofab.ucsb.edu/wiki/Special:Search"