Difference between revisions of "Photoresist Spin Coat Benches"
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(Created page with "{{tool|{{PAGENAME}} |picture=SolventBench.jpg |type = Wet Processing |super= Aidan Hopkins |phone=(805)839-3918x208 |location=? |email=hopkins@ece.ucsb.edu |description = Custom …") |
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| + | #redirect [[Wet Benches#Spin Coat Benches]] |
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| − | {{tool|{{PAGENAME}} |
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| − | |picture=SolventBench.jpg |
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| − | |type = Wet Processing |
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| − | |super= Aidan Hopkins |
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| − | |phone=(805)839-3918x208 |
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| − | |location=? |
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| − | |email=hopkins@ece.ucsb.edu |
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| − | |description = Custom Photoresist Spin Coat Bench |
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| − | |manufacturer = Pure Aire Corporation |
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| − | |materials = |
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| − | }} |
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| − | |||
| − | = About = |
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| − | The facility contains 3 stainless steel solvent benches for photoresist spin coating. The benches consist each of 2 integrated Headway PWM32 series photoresist spinners. Overhead and foot controls are provided. 8 preprogrammed recipes and 2 user-programmable recipes are offered. Automatic wafer lifting and centering stations are offered for spinning large wafers up to 8” in diameter. 6” or 8” Cee ultra-flat hotplates with 0.1°C temperature stability are preset for standard resist bake temperatures (90, 95, 100, 105, 110, 115°C). Other user-changeable hot plates are also provided. Nitrogen guns are also on both sides of the bench. Large resist bottles are stored in a refrigerator amd small user bottles are stored by group in a ventilated steel cabinet. Waste pipets and resist soaked wipes are collected for disposal. A list of stocked resists appears on the lithography processing web page. Other chemicals should be OK'd by laboratory staff prior to use in the laboratory. |
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| − | = Deatailed Specifications = |
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| − | *2 Headway PWM32 spinners per bench, multi-step programming |
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| − | *8 preset spin programs, 2 user defineable |
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| − | *Variety of wafer chucks for 5 mm x 5 mm pieces to 6” wafers |
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| − | *Lifters for large wafer centering |
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| − | *Preset 0.1°C stable, ultra-flat hotplates (90, 95, 1100, 105, 110, 115°C) |
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| − | *'''NO WAX''' on hotplates |
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| − | *Other hotplates for user defined temperatures |
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| − | *Hepa filtered laminar flow for Class 100 |
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| − | *Manual dispense of resist; particle filtering available |
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Latest revision as of 07:42, 12 July 2012
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