PECVD Recipes

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

• SiN Deposition Recipe
• SiN Deposition Particle Thickness Data

SiO₂ deposition (PECVD #1)

• SiO₂ Deposition Recipe
• SiO₂ Deposition Particle Thickness Data

PECVD 2 (Advanced Vacuum)

SiN deposition (PECVD #2)

• SiN Deposition Recipe
• SiN Deposition Particle Thickness Data

SiO₂ deposition (PECVD #2)

• SiO₂ Deposition Recipe
• SiO₂ Deposition Particle Thickness Data

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

• 50°
• 100°C
  • SiN Deposition Recipe (5W 100° High Stress)
  • SiN Deposition Recipe (50W 100° Medium Stress)
  • SiN Deposition Recipe (120W 100° Low Stress)
• 250°C

SiN (2% SiH₄ - No-Ar)

• 50°
• 100°C
• 250°C