Oxford ICP Etcher - Process Control Data
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Data - InP Ridge Etch (Oxford ICP Etcher)
 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
| InP Ridge Etch: INSERT ETCH PARAMS (IPC< Pressure, gasses etc.) | |||||
| Date | Sample# | Etch Rate (nm/min) | Etch Selectivity (InP/SiO2) | Comments | SEM Images |
| 2022-01-11 | Software timing bugs fixed - new etch rate appears slightly higher. | [1] (wrong) | |||
| 2022-01-11 | [2] (wrong) | ||||
| 2022-01-21 | [3] (wrong) | ||||