Difference between revisions of "News Feed"

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News from the U.C. Santa Barbara Nanofabrication Facility.
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News from the U.C. Santa Barbara Nanofabrication Facility
   
=== Second Feed Item ===
 
Brand New! I just made a [[Main page|new item]]! --[[User:Anon|Anon]] 10:12, 8 December 2006 (MST)
 
   
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=== First Feed Item ===
 
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==CHIPS Act Award Announced to USC and UCSB NanoFab==
Here is the content for my first item ever. --[[User:Anon|Anon]] 08:42, 4 December 2006 (MST)
 
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[https://carbajal.house.gov/news/documentsingle.aspx?DocumentID=1672 U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab] on receiving a [https://www.nist.gov/chips CHIPS & Science Act] award, as part of the [https://microelectronicscommons.org/ California DREAMS Hub (Microelectronics Commons) led by USC].
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-- [[User:John d|Demis]] 12:06, 4 October 2023 (PDT)
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==New Deep Silicon Etcher==
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The new Plasma-Therm Versaline DSE III DRIE etcher is qualified and available for use. The new tool features much higher etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. [[User:John d|-- Demis]] ([[User talk:John d|talk]]) 22:16, 27 November 2017 (PST)
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==2016 Survey Results==
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See the May 2016 User Survey Results: {{file|Survey052016.pdf|Survey Results}}
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==CAIBE Ion Mill Available==
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The [[CAIBE (Oxford Ion Mill)]] is up and running! Contact [[Brian Lingg]] for more information. ''(7/2015)''
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==NanoFiles SFTP Online==
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Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check [http://signupmonkey.ece.ucsb.edu SignupMonkey] for details. ''(7/7/2013)''
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Latest revision as of 12:10, 4 October 2023

News from the U.C. Santa Barbara Nanofabrication Facility


CHIPS Act Award Announced to USC and UCSB NanoFab

U.S. Congressman Salud Carbajal congratulates UCSB and the NanoFab on receiving a CHIPS & Science Act award, as part of the California DREAMS Hub (Microelectronics Commons) led by USC. -- Demis 12:06, 4 October 2023 (PDT)

New Deep Silicon Etcher

The new Plasma-Therm Versaline DSE III DRIE etcher is qualified and available for use. The new tool features much higher etch rates, improved uniformity, and allows for photoresist up to the edges of the wafer. -- Demis (talk) 22:16, 27 November 2017 (PST)

2016 Survey Results

See the May 2016 User Survey Results: Survey Results

CAIBE Ion Mill Available

The CAIBE (Oxford Ion Mill) is up and running! Contact Brian Lingg for more information. (7/2015)

NanoFiles SFTP Online

Files generated with Nanofab tools (SEM images, AFM profiles, etc.) are now available on the nanofab SFTP server. Please check SignupMonkey for details. (7/7/2013)