Difference between revisions of "Molecular Vapor Deposition"

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(link to nanoimprint FDTS recipe)
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= About  =
 
= About  =
 
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C.  Multi-step recipes can be created.  The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
 
The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C.  Multi-step recipes can be created.  The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.
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== Recipes ==
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* [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Nanoimprinting_Recipes Nanoimprinting recipes] using FDTS non-stick layer

Revision as of 19:25, 10 May 2018

Molecular Vapor Deposition
MVD.jpg
Tool Type Vacuum Deposition
Location Bay 4
Supervisor Aidan Hopkins
Supervisor Phone (805) 893-2343
Supervisor E-Mail hopkins@ece.ucsb.edu
Description Molecular Vapor Deposition System
Manufacturer Applied Microstructures Inc.
Vacuum Deposition Recipes


About

The Molecular Vapor deposition system is used for deposition of a monolayer-thick fluorocarbon film for producing extremely hydrophobic surfaces used for anti-sticking layers for nanoimprinting or anti-stiction layers for MEMS. The system has integrated Oxygen plasma cleaning for organic removal and surface activation and can be run at temperatures up to 80°C. Multi-step recipes can be created. The system is currently configured for FDTS (perflourodecyltricholorsilane) and water to producing the coatings. Up to 6” wafers can be coated in the system.

Recipes