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Important Announcements ASML Up; Network status We are running a newer computer; Nanofiles sync & JobCreator functionality will be restored in the next few weeks. // John d 09:00, 22 July 2022 (PDT) Face-Masks Optional as of June 13 You are not required to wear a mask in UC buildings at this time. You are also not required to wear a mask in the Nanofab if desired. We will still provide masks at the metal table in front of the cleanroom entry. See the UCSB announcement at this link. See the full policies at COVID-19_User_Policies // John d 11:20, 13 June 2022 (PDT) New EBL Rates Effective Dec.1, 2021, all of our electron beam lithography rates are lowered. The new rates are as follows: Industrial Users: $405/hour UC Academic Users: $126/hour Non-UC Academic Users: $150/hour UCSB CNSI Incubator USers: $260/hour //Thibeault 12:21, 9 December 2021 (PST) General Information NanoFab Users are responsible for understanding their chemistry, risks and usage of various chemicals. Please read the MSDS sheets for the chemicals you use! Users can add qualified processing data to the Wiki pages; see the Editing_Tutorials for how to do that. Supervisors of individuals using the facility, e.g., UCSB Principal Investigators and external user managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility. They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "Chemical Hygiene Plan" per OSHA regulations. The information on this site should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this site information within their Plans. UCSB EH&S can provide assistance to supervisors in preparing their Plans. News & Announcements News from the U.C. Santa Barbara Nanofabrication Facility. Oxford PlasmaPro ICP Etcher installed We have a new ICP etcher in Bay 2: Oxford_ICP_Etcher_(PlasmaPro_100_Cobra) The tool has been qualified for InP Ridge and InGaAsP Grating etches, and is intended for III-V etching in general (GaAs, GaN, GaSb etc.) In addition, the tool is capable of Atomic Layer Etching on various materials. Contact the supervisor for training. // John d 11:27, 29 September 2021 (PDT) SiO2 etching, High-Aspect Ratio Dr. Bill Mitchell recently published an article detailing high-aspect ratio SiO2 etching (JVST-A, May 2021) in the Plasma-Therm Fluorine ICP etcher, using a novel Ruthenium Hard Mask. Ruthenium can be deposited using the Oxford ALD or AJA Sputter and etched in one of the Panasonic ICP's. You can find a full process flow at the FL-ICP's Recipe Page, in this case using a Sputtered Ru hard mask and I-line stepper lithography. // John d 08:05, 27 May 2021 (PDT) Wafer Polisher available We have added an Allied Wafer Polish tool to our equipment list. Contact Brian Lingg for more information. // John d 16:49, 10 May 2021 (PDT) Digital Microscope: Olympus DSX-1000 You'll see a new digital microscope in Bay 4/Metrology, that's our new Olympus DSX-1000. We are currently developing procedures, keep an eye out for training emails. // John d 13:49, 8 April 2021 (PDT) Raith Velion: FIB/SEM Installation We have installed a new state-of-the-art focused ion beam/electron beam tool in Bay 1. The Raith Velion enables synchronized interferometric stage, Focused-ion Beam Lithography with ~10nm features or less, live SEM during writing, and Electron-Beam Lithography. Learn more about the tool's capabilities at the Raith website: Raith Products: Velion. VIDEO: Synchronized FIB beam + Laser Interferometric Stage write, with live SEM Tool qualification is currently underway. Dr. Dan Read is be the resident expert on this new tool. // John d 06:53, 30 November 2020 (PST) Important Links: Staff List Tool List Chemical List & MSDS Sheets Lab Rules FAQs External Links: SignUpMonkey NanoTech Homepage UCSB EE Dept. Get into the Lab Fabrication Services Seminars: Tech Talks Seminar Series

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