MLA Recipes
Jump to navigation
Jump to search
The printable version is no longer supported and may have rendering errors. Please update your browser bookmarks and please use the default browser print function instead.
Maskless Aligner (Heidelberg MLA150)
Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc. “Soft Bake” is right after spin, “PEB” is post-exposure bake - right after exposure
Resist | Spin Cond. | Soft Bake | Thickness | Laser (nm) | Exposure Dose (mJ/cm2) | DeFocus | Post-Exposure Bake | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ4110 | 4 krpm/30s | 95°C/60s | ~ 1.1 µm | 405 | 240 | 5 | none | AZ400K:DI 1:4 | 50s | Used MLA design (good for isolated lines 0.8-1um) |
AZ4330 | 4 krpm/30s | 95°C/60s | ~ 3.3 µm | 405 | 320 | 6 | none | AZ400K:DI 1:4 | 90s | Used MLA design |
AZ4620 | ||||||||||
SPR 220-3.0 | 2.5 krpm/30s | 115°C/90” | ~ 2.7 µm | 405 | 325 | - 4 | 115°C/90s | AZ300MIF | 60s | Used MLA design |
SPR 955-CM0.9 | 3 krpm/30s | 95°C/90” | ~ 0.9 µm | 405 | 250 | - 7 | 110°C/90s | AZ300MIF | 60s | Used MLA design |
THMR-3600HP | 1.5 krpm/45s250 rpm/s | 100°C/60s | 0.430µm | 405 | 180–220 | -4 | 100°C/60s | AZ300MiF | 20s | line/space:
low dose for clear-field, high does for dark-field |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc. “Soft Bake” is right after spin, “PEB” is post-exposure bake - right after exposure. “Flood exposure” is only for AZ5214 for image reversal, after PEB.
Resist | Spin Cond. | Soft Bake | Thickness | Laser (nm) | Exposure Dose (mJ/cm2) | DeFocus | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|---|
AZ5214 | 6 krpm/30s | 95°C/60s | ~ 1.0 µm | 375 | 35 | - 5 | 110°C/60s | 60" | AZ300MIF | 60s | Used UCSB design. Good for up to ~1.3um open line space. |
AZnLOF2020 | 4 krpm/30s | 110°C/60s | ~ 2.1µm | 375 | 340 | - 3 | 110°C/60s | none | AZ300MIF | 90s | Used UCSB design. Good for 2um open line space. |
SU-8 2075 | ~70µm | 375 | Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. |
Greyscale Lithography (MLA150)
Description...
Resist | Spin Cond. | Bake | Thickness | Exposure Dose (mJ/cm2) | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ4620 | – krpm/30” | 95°C/60” | 60" | AZ300MIF | 60" |
|