Difference between revisions of "Lithography Recipes"

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*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}}  
 
*{{fl|SPR950-Positive-Resist-Datasheet.pdf|SPR950-0.8}}  
 
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}}  
 
*{{fl|SPR955-Positive-Resist-Datasheet.pdf|SPR955CM (SPR955CM-0.9, SPR955CM-1.8)}}  
*{{fl|UV6-Positive-Resist-Datasheet.pdf|UV6-0.7}}
+
*{{fl|UV6-Positive-Resist-Datasheet.pdf|UV6-0.7}}
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*{{fl|UV210-Positive-Resist-Datasheet.pdf|UV210-0.3}}
  
 
;Negative Photoresists
 
;Negative Photoresists
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;Anti-Reflection Coatings
 
;Anti-Reflection Coatings
  
*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}}
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*{{fl|XHRiC-Anti-Reflective-Coating.pdf|XHRiC}}
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*{{fl|AR2-Anti-Reflective-Coating.pdf|AR2}}
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*{{fl|DS-K101-Anti-Reflective-Coating.pdf|DS-K101 (developable BARC)}}
  
 
;Developers
 
;Developers

Revision as of 14:24, 22 April 2013

Lift-Off Techniques

Chemical Datasheets

Positive Photoresists
Negative Photoresists
Underlayers
E-beam resists
Nanoimprinting
Contrast Enhancement Materials
Anti-Reflection Coatings
Developers
Photoresist Removers

Recipes

  • R = Recipe is available. Clicking this link will take you to the recipe.
  • A = Material is available for use, but no recipes are provided.
Lithography Recipes

Contact Aligners Steppers Flood Expose E-Beam Lithography
Positive Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


AZ4110 R R
AZ4210 R R





AZ4330RS R R
OCG 825-35CS







SPR 950-0.8
SPR 955 CM-0.9

R R



SPR 955 CM-1.8 R R
SPR 220-3.0 R R R R



SPR 220-7.0 R R R R
THMR-IP3600 HP D







UV6-0.7
Negative Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


AZ5214-EIR R R R R
AZnLOF 2020 R R R R
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510 R R
UVN30-0.5
SU-8 2015
Underlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


PMGI SF-11







PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


CEM-365 IS
E-Beam Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


 ??????
 ???????
Nanoimprint Resists SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)


MR-I 7020
Nanonex NX-1020
SUSS MJB-3 SUSS MA-6 Stepper 1
(GCA 6300)
Stepper 2
(AutoStep 200)
Stepper 3
(ASML DUV)
MLA150
(Heidelberg)