Difference between revisions of "ICP Etching Recipes"

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==SiN<sub>x</sub> Etching (Panasonic 2)==
 
==SiN<sub>x</sub> Etching (Panasonic 2)==
*[[media:Panasonic2-ICP-Plasma-Etch-SiN-nanoscale-rev1.pdf|SiN<sub>x</sub> Nanoscale Etch Recipe - CHF3/O2]]
+
*[[media:Panasonic2-ICP-Plasma-Etch-SiN-nanoscale-rev1.pdf|SiN<sub>x</sub> Nanoscale Etch Recipe - CHF<sub>3</sub>/O<sub>2</sub>]]
  
 
==Al Etch (Panasonic 2)==
 
==Al Etch (Panasonic 2)==

Revision as of 12:29, 22 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

SiNx Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs Etch

AlGaAs Etch

InP Etch (Unaxis VLR)

InP Etch

InP Etch (H2 Ar)

GaN Etch (Unaxis VLR)