Difference between revisions of "Dry Etching Recipes"
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|[[ICP Etching Recipes#GaAs Etch .28Oxford ICP Etcher.29|R]] |
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Revision as of 08:33, 19 December 2022
Process Control Data
See linked page for process control data (dep rate/stress etc. over time), for a selection of often-used thin-film depositions.
Dry Etching Tools/Materials Table
- R: Recipe is available. Clicking this link will take you to the recipe.
- A: Material is available for use, but no recipes are provided.