Difference between revisions of "Dry Etching Recipes"

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|{{rl|Other Dry Etching Recipes|Other Dry Etch (CAIBE (Oxford Ion Mill))}}
 
 
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|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
 
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 
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|{{rl|ICP Etching Recipes|ICP-Etch (Unaxis VLR)|GaAs-AlGaAs Etch (Unaxis VLR)|AlGaAs Etch (Unaxis VLR)}}
 
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| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
 
 
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| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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|{{rl|RIE Etching Recipes|RIE 5 (PlasmaTherm)|GaN Etch (RIE 5)}}
 
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| {{rl|RIE Etching Recipes|RIE 3 (MRC)|SiO<sub>2</sub> Etching (RIE 3)}}
 
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| {{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
 
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
 
|{{rl|ICP Etching Recipes|GaAs Etch (Panasonic 2)}}
 
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|{{rl|RIE Etching Recipes|RIE 3 (MRC)|SiN<sub>x</sub> Etching (RIE 3)}}
 
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|{{rl|RIE Etching Recipes|AlGaAs Etch (RIE 5)}}
 
 
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|{{rl|ICP Etching Recipes|AlGaAs Etch (Panasonic 1)}}
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| {{rl|ICP Etching Recipes|Si Etch (PlasmaTherm/Bosch Etch)}}
 
 
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Revision as of 13:59, 22 September 2017