ASML Stepper 3 - UCSB Test Reticles

From UCSB Nanofab Wiki
Revision as of 02:58, 1 August 2018 by John d (talk | contribs) (added UCSB-OPC1 and alignment marks for that reticle)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

Reticle ID: "UCSB-OPC1"

Alignment Markers

Image ID Image Size

X , Y

(Wafer, mm)

Image Shift

X , Y

(Wafer, mm)

Notes/Description Schematics
GCA_Align 0.530000 , 0.140000 -6.750000 , 9.450000 ImageShift references the center of the -X- "global" mark.

The ==||| "Local" mark is X+200µm to the right

has 1.1mm margin on all sides

Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png
Multi-Purpose Alignment Mark - Positive 0.900000 , 0.900000 -6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

0.925mm margin on all sides

>> Use this for Dicing Alginment Guides

GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png
Multi-Purpose Alignment Mark - Positive 0.710000 , 0.710000 6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

Blank space on left+top sides

1.0mm margin on all sides

GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png