Difference between revisions of "ASML Stepper 3 - UCSB Test Reticles"

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m (typo)
(added contact_mark)
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has 1.1mm margin on all sides
 
has 1.1mm margin on all sides
|[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
+
|White is Chrome, Pattern is Clear[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
 
|-
 
|-
 
|Multi-Purpose Alignment Mark - Positive
 
|Multi-Purpose Alignment Mark - Positive
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>> Use this for Dicing Alginment Guides
 
>> Use this for Dicing Alginment Guides
  +
|White is Chrome, Pattern is Clear
|[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
+
[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
 
|-
 
|-
|Multi-Purpose Alignment Mark - Positive
+
|Multi-Purpose Alignment Mark - Negative
 
|0.710000 , 0.710000
 
|0.710000 , 0.710000
 
|6.750000 , -9.450000
 
|6.750000 , -9.450000
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Smaller "+" mark is (0.225,-0.225)mm down-right
 
Smaller "+" mark is (0.225,-0.225)mm down-right
   
Blank space on left+top sides
+
Blank (masked) space on left+top sides
   
 
1.0mm margin on all sides
 
1.0mm margin on all sides
  +
|Pattern is Clear
|[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
+
[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
  +
|-
  +
|Contact_Mark
  +
|0.564000 , 0.564000
  +
|6.750000 , 9.450000
  +
|ImageShift references the center of the contact alignment mark "+"
  +
  +
with 1.1mm margin on all sides
  +
|[[File:Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png|frameless|146x146px]]
 
|}
 
|}
   

Revision as of 03:29, 1 August 2018

Reticle ID: "UCSB-OPC1"

Alignment Markers

Image ID Image Size

X , Y

(Wafer, mm)

Image Shift

X , Y

(Wafer, mm)

Notes/Description Schematics
GCA_Align 0.530000 , 0.140000 -6.750000 , 9.450000 ImageShift references the center of the -X- "global" mark.

The ==||| "Local" mark is X+200µm to the right

has 1.1mm margin on all sides

White is Chrome, Pattern is ClearStepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png
Multi-Purpose Alignment Mark - Positive 0.900000 , 0.900000 -6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

0.925mm margin on all sides

>> Use this for Dicing Alginment Guides

White is Chrome, Pattern is Clear

GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png

Multi-Purpose Alignment Mark - Negative 0.710000 , 0.710000 6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

Blank (masked) space on left+top sides

1.0mm margin on all sides

Pattern is Clear

GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png

Contact_Mark 0.564000 , 0.564000 6.750000 , 9.450000 ImageShift references the center of the contact alignment mark "+"

with 1.1mm margin on all sides

Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png

Resolution Test Charts

The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system window-off only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.

In addition, the repeating cells allow us to test for the proper optical proximity correction algorithm. The Five Dense_... patterns are for calibrating the OPC algorithm, and are not for user analysis.

Calibration Chart Layout

Layout of the repeating calibration charts
Layout of the repeating calibration charts

Resolution Chart Schematic

"resolution_chart_ORIG" cell in the above.

Resolution Chart Layout schematic
Resolution Chart Layout, with res. test from 2.00µm to 0.130µm

The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:

OPC'd Resolution Chart Layout schematic
OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm

Coords for "UCSB_Cal" Resolution Test Patterns

Each of the above cells is repeated on the following coordinates:

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

2.610000 , 2.610000 -9.450000 12.150000
same as above -6.750000 12.150000
-4.050000 12.150000
-1.350000 12.150000
1.350000 12.150000
4.050000 12.150000
6.750000 12.150000
9.450000 12.150000
-9.450000 9.450000
Alignment Marker
-4.050000 9.450000
-1.350000 9.450000
1.350000 9.450000
4.050000 9.450000
Alignment Marker
9.450000 9.450000
-9.450000 6.750000
-6.750000 6.750000
-4.050000 6.750000
-1.350000 6.750000
1.350000 6.750000
4.050000 6.750000
6.750000 6.750000
9.450000 6.750000
-9.450000 4.050000
-6.750000 4.050000
-4.050000 4.050000
-1.350000 4.050000
1.350000 4.050000
4.050000 4.050000
6.750000 4.050000
9.450000 4.050000
-9.450000 1.350000
-6.750000 1.350000
-4.050000 1.350000
-1.350000 1.350000
1.350000 1.350000
4.050000 1.350000
6.750000 1.350000
9.450000 1.350000
-9.450000 -1.350000
-6.750000 -1.350000
-4.050000 -1.350000
-1.350000 -1.350000
1.350000 -1.350000
4.050000 -1.350000
6.750000 -1.350000
9.450000 -1.350000
-9.450000 -4.050000
-6.750000 -4.050000
-4.050000 -4.050000
-1.350000 -4.050000
1.350000 -4.050000
4.050000 -4.050000
6.750000 -4.050000
9.450000 -4.050000
-9.450000 -6.750000
-6.750000 -6.750000
-4.050000 -6.750000
-1.350000 -6.750000
1.350000 -6.750000
4.050000 -6.750000
6.750000 -6.750000
9.450000 -6.750000
-9.450000 -9.450000
Alignment Marker
-4.050000 -9.450000
-1.350000 -9.450000
1.350000 -9.450000
4.050000 -9.450000
Alignment Marker
9.450000 -9.450000
-9.450000 -12.150000
-6.750000 -12.150000
-4.050000 -12.150000
-1.350000 -12.150000
1.350000 -12.150000
4.050000 -12.150000
6.750000 -12.150000
9.450000 -12.150000