Difference between revisions of "ASML Stepper 3 - UCSB Test Reticles"

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m (→‎Alignment Markers: MA6 mark: contact Brian/Demis for GDS)
(→‎Alignment Markers: added CAD files for alignment marks)
 
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== Reticle ID: "'''UCSB-OPC1'''" ==
 +
==Reticle ID: "'''UCSB-OPC1'''"==
 
This reticle is always installed in the system, in the "System Reticles" Box #1.
 
This reticle is always installed in the system, in the "System Reticles" Box #1.
   
 
The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.
 
The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.
   
−
=== Alignment Markers ===
 +
===Alignment Markers===
 
{| class="wikitable"
  
{| class="wikitable"
 
!Image ID
  
!Image ID
Line 26: Line 26:
 
has 1.1mm margin on all sides
  
has 1.1mm margin on all sides
 
|White is Chrome, Pattern is Clear[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
  
|White is Chrome, Pattern is Clear[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
  +
[[Media:GCA stepper align.gds|<small>CAD File (GDS):GCA_stepper_align.gds</small>]]
 
|-
  
|-
 
|E-Beam Litho Alignment Mark - Positive
  
|E-Beam Litho Alignment Mark - Positive
Line 36: Line 37:
 
|White is Chrome, Pattern is Clear
  
|White is Chrome, Pattern is Clear
 
[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
  
[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
  +
  +
[[Media:EBL-GlobalMulti POS.gds|<small>CAD File (GDS): EBL-GlobalMulti_POS.gds</small>]]
 
|-
  
|-
 
|E-Beam Litho Alignment Mark - Negative
  
|E-Beam Litho Alignment Mark - Negative
Line 48: Line 51:
 
|Striped area is Clear
  
|Striped area is Clear
 
[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
  
[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
  +
  +
[[Media:EBL-GlobalMulti NEG.gds|<small>CAD File (GDS): EBL-GlobalMulti_NEG.gds</small>]]
 
|-
  
|-
 
|Contact_Mark
  
|Contact_Mark
Line 61: Line 66:
 
|White is Chrome, Striped area is Clear
  
|White is Chrome, Striped area is Clear
 
[[File:Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png|frameless|146x146px]]
  
[[File:Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png|frameless|146x146px]]
  +
  +
[[Media:Contact-AlignFront.gds|<small>CAD File (GDS): Contact-AlignFront.gds</small>]]
  +
  +
[[Media:MA6-FrontBack AlignMarks only.gds|<small>Corresponding male/female alignment marks (GDS): MA6-FrontBack_AlignMarks_only.gds</small>]]
 
|}
  
|}
   
−
=== Resolution Test Charts ===
 +
===Resolution Test Charts===
 
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
  
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
   
 
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] (OPC) algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
  
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] (OPC) algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
   
−
==== Calibration Chart Layout ====
 +
====Calibration Chart Layout====
 
Cell name is "''UCSB_Cal''", with coordinates below pointing to center of this cell.[[File:UCSB cal - Screen Shot 2018-07-23 at 12.06.58 PM.png|alt=Layout of the repeating calibration charts|none|thumb|512x512px|Layout of the repeating calibration charts]]
  
Cell name is "''UCSB_Cal''", with coordinates below pointing to center of this cell.[[File:UCSB cal - Screen Shot 2018-07-23 at 12.06.58 PM.png|alt=Layout of the repeating calibration charts|none|thumb|512x512px|Layout of the repeating calibration charts]]
   
−
==== Resolution Chart Schematic ====
 +
====Resolution Chart Schematic====
 
"resolution_chart_ORIG" cell in the above.
  
"resolution_chart_ORIG" cell in the above.
 
[[File:Resolution Chart - Screen Shot 2018-07-23 at 1.36.31 PM.png|alt=Resolution Chart Layout schematic|none|thumb|400x400px|'''"resolution_chart_ORIG":''' Resolution Chart Layout, with res. test from 2.00µm to 0.130µm]]
  
[[File:Resolution Chart - Screen Shot 2018-07-23 at 1.36.31 PM.png|alt=Resolution Chart Layout schematic|none|thumb|400x400px|'''"resolution_chart_ORIG":''' Resolution Chart Layout, with res. test from 2.00µm to 0.130µm]]
Line 78: Line 87:
 
[[File:Resolution chart OPC - Screen Shot 2018-07-23 at 1.40.48 PM.png|alt=OPC'd Resolution Chart Layout schematic|none|thumb|395x395px|'''"resolution_chart_OPC":''' OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm]]
  
[[File:Resolution chart OPC - Screen Shot 2018-07-23 at 1.40.48 PM.png|alt=OPC'd Resolution Chart Layout schematic|none|thumb|395x395px|'''"resolution_chart_OPC":''' OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm]]
   
−
==== Coords for "resolution_chart" Calibration patterns ====
 +
====Coords for "resolution_chart" Calibration patterns====
 
''Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.''
  
''Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.''
   
Line 449: Line 458:
 
|}
  
|}
   
−
==== Coords for "UCSB_Cal" Calibration Patterns ====
 +
====Coords for "UCSB_Cal" Calibration Patterns====
 
Each of the above "''UCSB_Cal''" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "''UCSB_Cal''" cell):
  
Each of the above "''UCSB_Cal''" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "''UCSB_Cal''" cell):
 
{| class="wikitable"
  
{| class="wikitable"

Latest revision as of 15:32, 3 January 2023

Reticle ID: "UCSB-OPC1"

This reticle is always installed in the system, in the "System Reticles" Box #1.

The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating optical proximity correction on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.

Alignment Markers

Image ID Image Size

X , Y

(Wafer, mm)

Image Shift

X , Y

(Wafer, mm)

Notes/Description Schematics
GCA_Align 0.530000 , 0.140000 -6.750000 , 9.450000 ImageShift references the center of the -X- "global" mark.

The ==||| "Local" mark is X+200µm to the right

has 1.1mm margin on all sides

White is Chrome, Pattern is ClearStepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png

CAD File (GDS):GCA_stepper_align.gds

E-Beam Litho Alignment Mark - Positive 0.900000 , 0.900000 -6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

0.925mm margin on all sides

White is Chrome, Pattern is Clear

GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png

CAD File (GDS): EBL-GlobalMulti_POS.gds

E-Beam Litho Alignment Mark - Negative 0.710000 , 0.710000 6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

Blank (masked) space on left+top sides

1.0mm margin on all sides

Striped area is Clear

GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png

CAD File (GDS): EBL-GlobalMulti_NEG.gds

Contact_Mark 0.564000 , 0.564000 6.750000 , 9.450000 ImageShift references the center of the contact alignment mark "+"

with 1.1mm margin on all sides

Note the Polarity - will expose a ~550µm area.

Contact Demis or Brian for the CAD file for the male/female version of this mark.

White is Chrome, Striped area is Clear

Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png

CAD File (GDS): Contact-AlignFront.gds

Corresponding male/female alignment marks (GDS): MA6-FrontBack_AlignMarks_only.gds

Resolution Test Charts

The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.

In addition, the repeating cells allow us to test for the proper optical proximity correction (OPC) algorithm. The Five Dense_... patterns are for calibrating the OPC algorithm, and are not for user analysis.

Calibration Chart Layout

Cell name is "UCSB_Cal", with coordinates below pointing to center of this cell.

Layout of the repeating calibration charts
Layout of the repeating calibration charts

Resolution Chart Schematic

"resolution_chart_ORIG" cell in the above.

Resolution Chart Layout schematic
"resolution_chart_ORIG": Resolution Chart Layout, with res. test from 2.00µm to 0.130µm

The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:

OPC'd Resolution Chart Layout schematic
"resolution_chart_OPC": OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm

Coords for "resolution_chart" Calibration patterns

Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.

Note that some portion of the adjacent patterns will likely be exposed as well, due to the patterns not being surrounded by 1mm of chrome. Make sure you set your Cell Size large enough to make sure the bleed-over doesn't overlap with adjacent die.

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

0.605 , 1.005 -10.115000 12.150000
same for each -7.415000 12.150000
" " -4.715000 12.150000
" " -2.015000 12.150000
" " 0.685000 12.150000
" " 3.385000 12.150000
" " 6.085000 12.150000
" " 8.785000 12.150000
-10.115000 9.450000
Alignment Marker
-4.715000 9.450000
-2.015000 9.450000
0.685000 9.450000
3.385000 9.450000
Alignment Marker
8.785000 9.450000
-10.115000 6.750000
-7.415000 6.750000
-4.715000 6.750000
-2.015000 6.750000
0.685000 6.750000
3.385000 6.750000
6.085000 6.750000
8.785000 6.750000
-10.115000 4.050000
-7.415000 4.050000
-4.715000 4.050000
-2.015000 4.050000
0.685000 4.050000
3.385000 4.050000
6.085000 4.050000
8.785000 4.050000
-10.115000 1.350000
-7.415000 1.350000
-4.715000 1.350000
-2.015000 1.350000
0.685000 1.350000
3.385000 1.350000
6.085000 1.350000
8.785000 1.350000
-10.115000 -1.350000
-7.415000 -1.350000
-4.715000 -1.350000
-2.015000 -1.350000
0.685000 -1.350000
3.385000 -1.350000
6.085000 -1.350000
8.785000 -1.350000
-10.115000 -4.050000
-7.415000 -4.050000
-4.715000 -4.050000
-2.015000 -4.050000
0.685000 -4.050000
3.385000 -4.050000
6.085000 -4.050000
8.785000 -4.050000
-10.115000 -6.750000
-7.415000 -6.750000
-4.715000 -6.750000
-2.015000 -6.750000
0.685000 -6.750000
3.385000 -6.750000
6.085000 -6.750000
8.785000 -6.750000
-10.115000 -9.450000
Alignment Marker
-4.715000 -9.450000
-2.015000 -9.450000
0.685000 -9.450000
3.385000 -9.450000
Alignment Marker
8.785000 -9.450000
-10.115000 -12.150000
-7.415000 -12.150000
-4.715000 -12.150000
-2.015000 -12.150000
0.685000 -12.150000
3.385000 -12.150000
6.085000 -12.150000
8.785000 -12.150000

Coords for "UCSB_Cal" Calibration Patterns

Each of the above "UCSB_Cal" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "UCSB_Cal" cell):

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

2.610000 , 2.610000 -9.450000 12.150000
same as above -6.750000 12.150000
" " -4.050000 12.150000
" " -1.350000 12.150000
" " 1.350000 12.150000
" " 4.050000 12.150000
" " 6.750000 12.150000
" " 9.450000 12.150000
-9.450000 9.450000
Alignment Marker
-4.050000 9.450000
-1.350000 9.450000
1.350000 9.450000
4.050000 9.450000
Alignment Marker
9.450000 9.450000
-9.450000 6.750000
-6.750000 6.750000
-4.050000 6.750000
-1.350000 6.750000
1.350000 6.750000
4.050000 6.750000
6.750000 6.750000
9.450000 6.750000
-9.450000 4.050000
-6.750000 4.050000
-4.050000 4.050000
-1.350000 4.050000
1.350000 4.050000
4.050000 4.050000
6.750000 4.050000
9.450000 4.050000
-9.450000 1.350000
-6.750000 1.350000
-4.050000 1.350000
-1.350000 1.350000
1.350000 1.350000
4.050000 1.350000
6.750000 1.350000
9.450000 1.350000
-9.450000 -1.350000
-6.750000 -1.350000
-4.050000 -1.350000
-1.350000 -1.350000
1.350000 -1.350000
4.050000 -1.350000
6.750000 -1.350000
9.450000 -1.350000
-9.450000 -4.050000
-6.750000 -4.050000
-4.050000 -4.050000
-1.350000 -4.050000
1.350000 -4.050000
4.050000 -4.050000
6.750000 -4.050000
9.450000 -4.050000
-9.450000 -6.750000
-6.750000 -6.750000
-4.050000 -6.750000
-1.350000 -6.750000
1.350000 -6.750000
4.050000 -6.750000
6.750000 -6.750000
9.450000 -6.750000
-9.450000 -9.450000
Alignment Marker
-4.050000 -9.450000
-1.350000 -9.450000
1.350000 -9.450000
4.050000 -9.450000
Alignment Marker
9.450000 -9.450000
-9.450000 -12.150000
-6.750000 -12.150000
-4.050000 -12.150000
-1.350000 -12.150000
1.350000 -12.150000
4.050000 -12.150000
6.750000 -12.150000
9.450000 -12.150000
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