Difference between revisions of "Direct-Write Lithography Recipes"
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m (→Maskless Aligner (Heidelberg MLA150): greyscale) |
(Added PR's we are characterizing) |
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! width="75" |Bake |
! width="75" |Bake |
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! width="75" |Thickness |
! width="75" |Thickness |
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+ | !Laser (nm) |
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! width="125" |Exposure Time |
! width="125" |Exposure Time |
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− | ! width="100" | |
+ | ! width="100" |DeFocus |
! width="75" |PEB |
! width="75" |PEB |
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! width="100" |Developer |
! width="100" |Developer |
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! width="300" |Comments |
! width="300" |Comments |
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+ | |[[:File:AXP4000pb-Datasheet.pdf|AZ4110]] |
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− | |SPR955CM0.9 |
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− | | |
+ | |4 krpm/30s |
− | |95°C/ |
+ | |95°C/60s |
− | |~ |
+ | |~ 1.1 µm |
+ | |405 |
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+ | |''none'' |
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+ | |AZ400K:DI 1:4 |
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+ | |50s |
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+ | |- |
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+ | |[[:File:AXP4000pb-Datasheet.pdf|AZ4330]] |
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+ | |4 krpm/30s |
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+ | |95°C/60s |
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⚫ | |||
+ | |405 |
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+ | | |
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+ | | |
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+ | |''none'' |
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+ | |AZ400K:DI 1:4 |
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+ | |90s |
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+ | | |
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+ | |- |
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+ | |[[:File:Az p4620 photoresist data package.pdf|AZ4620]] |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | |- |
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+ | |[[:File:SPR220-Positive-Resist-Datasheet.pdf|SPR 220-3.0]] |
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+ | |2.5 krpm/30s |
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+ | |115°C/90” |
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+ | |~ 2.7 µm |
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+ | |405 |
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+ | | |
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+ | | |
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+ | |115°C/90s |
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|AZ300MIF |
|AZ300MIF |
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+ | |60s |
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+ | |- |
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+ | |[[:File:SPR955-Positive-Resist-Datasheet.pdf|SPR 955-CM0.9]] |
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+ | |3 krpm/30s |
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+ | |95°C/60” |
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+ | |~ 0.9 µm |
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+ | |405 |
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+ | | |
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+ | | |
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+ | |110°C/60s |
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+ | |AZ300MIF |
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+ | |60s |
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| align="left" | |
| align="left" | |
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+ | |- |
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− | *?? |
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+ | |[[:File:3600 D, D2v Spin Speed Curve.pdf|THMR-3600HP]] |
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− | *{{fl|SPR955CMstepperrecipe.pdf|See SPR955CM data file}} |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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=== Negative Resist (MLA150) === |
=== Negative Resist (MLA150) === |
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! width="75" |Bake |
! width="75" |Bake |
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! width="75" |Thickness |
! width="75" |Thickness |
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+ | !Laser (nm) |
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! width="125" |Exposure Time |
! width="125" |Exposure Time |
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− | ! width="100" | |
+ | ! width="100" |DeFocus |
! width="75" |PEB |
! width="75" |PEB |
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! width="75" |Flood |
! width="75" |Flood |
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! width="300" |Comments |
! width="300" |Comments |
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|- |
|- |
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+ | |[[:File:AZ5214-Negative-Resist-Datasheet.pdf|AZ5214]] |
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− | |AZ5214 |
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− | |6 krpm/ |
+ | |6 krpm/30s |
− | |95°C/ |
+ | |95°C/60s |
− | |~ 1.0 |
+ | |~ 1.0 µm |
+ | |405 |
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|60" |
|60" |
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|AZ300MIF |
|AZ300MIF |
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− | | |
+ | |60s |
| align="left" | |
| align="left" | |
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*??? |
*??? |
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+ | |- |
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+ | |AZnLOF2020 |
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+ | |3 krpm/30s |
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+ | |110°C/90s |
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+ | |~ 2.1µm |
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+ | |405 |
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+ | | |
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+ | | |
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+ | | |
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+ | |''none'' |
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+ | |AZ300MIF |
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+ | |60s |
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+ | | |
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+ | |- |
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+ | |[[:File:SU-8-2075-revA.pdf|SU-8 2075]] |
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+ | | |
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+ | | |
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+ | |~70µm |
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+ | |375 |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | | |
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+ | |Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. |
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! width="300" |Comments |
! width="300" |Comments |
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|- |
|- |
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+ | |AZ4620Z5214 |
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− | |AZ5214 |
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− | | |
+ | |?? krpm/30” |
|95°C/60” |
|95°C/60” |
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+ | |?? µm |
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⚫ | |||
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Revision as of 16:27, 2 October 2020
Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Maskless Aligner (Heidelberg MLA150)
Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Time | DeFocus | PEB | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ4110 | 4 krpm/30s | 95°C/60s | ~ 1.1 µm | 405 | none | AZ400K:DI 1:4 | 50s | |||
AZ4330 | 4 krpm/30s | 95°C/60s | ~ 3.3 µm | 405 | none | AZ400K:DI 1:4 | 90s | |||
AZ4620 | ||||||||||
SPR 220-3.0 | 2.5 krpm/30s | 115°C/90” | ~ 2.7 µm | 405 | 115°C/90s | AZ300MIF | 60s | |||
SPR 955-CM0.9 | 3 krpm/30s | 95°C/60” | ~ 0.9 µm | 405 | 110°C/60s | AZ300MIF | 60s | |||
THMR-3600HP |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Time | DeFocus | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|---|
AZ5214 | 6 krpm/30s | 95°C/60s | ~ 1.0 µm | 405 | 60" | AZ300MIF | 60s |
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AZnLOF2020 | 3 krpm/30s | 110°C/90s | ~ 2.1µm | 405 | none | AZ300MIF | 60s | ||||
SU-8 2075 | ~70µm | 375 | Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. |
Greyscale Lithography
Description...
Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ4620Z5214 | ?? krpm/30” | 95°C/60” | ?? µm | 60" | AZ300MIF | 60" |
|