Difference between revisions of "UV Ozone Reactor"
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|picture=Ozone.jpg |
|picture=Ozone.jpg |
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|type = Dry Etch |
|type = Dry Etch |
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| − | |super= |
+ | |super= Lee Sawyer |
|model=M-144AX |
|model=M-144AX |
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|location=Bay 5 |
|location=Bay 5 |
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|manufacturer = Jelight |
|manufacturer = Jelight |
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| − | == |
+ | ==About== |
The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment. |
The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment. |
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| + | ==Documentation== |
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| − | == Operating Procedures == |
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| − | * [[UV Ozone Quick Start|Quick Start]] |
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| − | * |
+ | *[[UV Ozone Quick Start|Quick Start]] |
| + | *[//www.nanotech.ucsb.edu/wiki/images/7/79/UV_Ozone_Manual_Jelight_M-144AX.pdf UV Ozone Manual] |
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Revision as of 15:33, 11 September 2019
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About
The UV Ozone is manufactured by Jelight, model M-144AX. It can be used for Oxygen activation, etching or oxidation of a surface without ion bombardment.