Difference between revisions of "Tool List"
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* [[Critical Point Dryer]] |
* [[Critical Point Dryer]] |
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* [[Spin Rinse Dryer (SemiTool)]] |
* [[Spin Rinse Dryer (SemiTool)]] |
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| − | * [[Scales]] |
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| − | ** [[Wet Etch Wafer Scale]] |
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| − | ** [[Solvent Processing Wafer Scale]] |
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| ⚫ | |||
* [[Chemical-Mechanical Polisher (Logitech)]] |
* [[Chemical-Mechanical Polisher (Logitech)]] |
||
| ⚫ | |||
* Wet Benches |
* Wet Benches |
||
**[[Acid Benches]] |
**[[Acid Benches]] |
||
Revision as of 14:50, 10 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)