Difference between revisions of "Tool List"
Jump to navigation
Jump to search
| Line 24: | Line 24: | ||
|} |
|} |
||
| − | =Vacuum Deposition= |
+ | = Vacuum Deposition = |
| + | |||
{| |
{| |
||
| − | |-valign="top" |
+ | |- valign="top" |
| − | |width=300| |
+ | | width="300" | |
| − | * |
+ | *[[E-Beam 1 (Sharon)]] |
| − | * |
+ | *[[E-Beam 2 (Custom)]] |
| − | * |
+ | *[[E-Beam 3 (Temescal)]] |
| − | * |
+ | *[[E-Beam 4 (CHA)]] |
| − | * |
+ | *[[Sputter 1 (Custom)]] |
| − | * |
+ | *[[Sputter 2 (SFI Endeavor)]] |
| − | * |
+ | *[[Sputter 3 (ATC 2000-F)]] |
| − | * |
+ | *[[Sputter 4 (ATC 2200-V)]] |
| − | * |
+ | *[[Sputter 5 (Lesker AXXIS)]] |
| + | |||
| − | |width=400| |
+ | | width="400" | |
| ⚫ | |||
| − | * |
+ | *[[PECVD 1 (PlasmaTherm 790)]] |
| ⚫ | |||
| − | * [[Thermal Evap 1]] |
||
| − | * |
+ | *[[Thermal Evap 1]] |
| − | * |
+ | *[[Thermal Evap 2]] |
| + | *[[Unaxis VLR ICP-PECVD]] |
||
| − | * [[Ion Beam Deposition (Veeco NEXUS)]] |
||
| − | * |
+ | *[[Ion Beam Deposition (Veeco NEXUS)]] |
| + | *[[Molecular Vapor Deposition]] |
||
| − | * |
+ | *[[Atomic Layer Deposision (Oxford FlexAL)]] |
| − | |- |
||
| + | |||
|} |
|} |
||
Revision as of 13:14, 9 July 2012
Lithography
Vacuum Deposition
Dry Etch
Wet Processing
Thermal Processing
- Rapid Thermal Processor (AET RX6)
- Strip Annealer
- Tube Furnace (Tystar 8300)
- Tube Furnace Wafer Bonding (Thermco)
- Tube Furnace AlGaAs Oxidation (Linberg)