Difference between revisions of "Tool List"

From UCSB Nanofab Wiki
Jump to: navigation, search
(Created page with "__NOTOC__ =Lithography= * Suss Aligners * IR Aligner * DUV Flood Expose * Ovens * Stepper 1 * Stepper 2 * Stepper 3 * E-Beam Lithography System =…")
 
(Vacuum Deposition)
Line 15: Line 15:
 
* [[E-Beam Evaporator 3]]
 
* [[E-Beam Evaporator 3]]
 
* [[E-Beam Evaporator 4]]
 
* [[E-Beam Evaporator 4]]
* [[Sputter Tool 1]]
+
* [[Sputter 1]]
* [[Sputter Tool 2]]
+
* [[Sputter 2]]
* [[Sputter Tool 3]]
+
* [[Sputter 3]]
* [[Sputter Tool 4]]
+
* [[Sputter 4]]
* [[Sputter Tool 5]]
+
* [[Sputter 5]]
 
* [[PECVD 1]]
 
* [[PECVD 1]]
 
* [[PECVD 2]]
 
* [[PECVD 2]]
* [[VLR PECVD]]
+
* [[Unaxis VLR ICP-PECVD]]
 
* [[IBD]]
 
* [[IBD]]
 
* [[Molecular Vapor Deposition]]
 
* [[Molecular Vapor Deposition]]

Revision as of 14:04, 27 June 2012