Difference between revisions of "Tool List"

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(Vacuum Deposition)
(Dry Etch)
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*[[Si Deep RIE (PlasmaTherm/Bosch Etch)]]
 
*[[Si Deep RIE (PlasmaTherm/Bosch Etch)]]
 
*[[Ashers (Technics PEII)]]
 
*[[Ashers (Technics PEII)]]
*[[Unaxis VLR ICP-Etch]]
+
*[[UV Ozone Reactor]]
 
 
| width="400" |
 
| width="400" |
 
*[[ICP Etch 1 (Panasonic E626I)]]
 
*[[ICP Etch 1 (Panasonic E626I)]]
 
*[[ICP Etch 2 (Panasonic E640)]]
 
*[[ICP Etch 2 (Panasonic E640)]]
*[[UV Ozone Reactor]]
+
*[[ICP-Etch (Unaxis VLR)]]
 
*[[Plasma Clean (Gasonics 2000)]]
 
*[[Plasma Clean (Gasonics 2000)]]
 
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
 
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]

Revision as of 06:51, 11 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization