Difference between revisions of "Tool List"

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(Lithography)
(Lithography)
Line 17: Line 17:
 
* [[Stepper 3 (ASML)]]
 
* [[Stepper 3 (ASML)]]
 
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
 
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
* [[Nano-Imprint Tool (Nanonex NX2000)]]
+
* [[Nano-Imprint (Nanonex NX2000)]]
 
* [[Contact Aligner (SUSS MA-6)]]
 
* [[Contact Aligner (SUSS MA-6)]]
 
* [[Wafer Bonder (SUSS SB6-8E)]]
 
* [[Wafer Bonder (SUSS SB6-8E)]]

Revision as of 05:58, 11 July 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization