Difference between revisions of "Tool List"

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(Vacuum Deposition)
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=Dry Etch=
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= Dry Etch =
  +
 
{|
 
{|
|-valign="top"
+
|- valign="top"
|width=300|
+
| width="300" |
* [[RIE 1 (Custom)]]
+
*[[RIE 1 (Custom)]]
* [[RIE 2 (MRC)]]
+
*[[RIE 2 (MRC)]]
* [[RIE 3 (MRC)]]
+
*[[RIE 3 (MRC)]]
* [[RIE 5 (PlasmaTherm SLR)]]
+
*[[RIE 5 (PlasmaTherm SLR)]]
* [[Si Deep RIE (Bosch Etch)]]
+
*[[Si Deep RIE (Bosch Etch)]]
* [[Ashers (Technics PEII]]
+
*[[Ashers (Technics PEII]]
* [[Unaxis VLR ICP-Etch]]
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*[[Unaxis VLR ICP-Etch]]
  +
|width=400|
 
  +
| width="400" |
* [[ICP Etch 1 (Panasonic E620)]]
 
* [[ICP Etch 2 (Panasonic E626)]]
+
*[[ICP Etch 1 (Panasonic E620)]]
  +
*[[ICP Etch 2 (Panasonic E626)]]
* [[UV Ozone Reactor]]
 
  +
*[[UV Ozone Reactor]]
* [[Plasma Clean (Gasonics 2000)]]
 
* [[XeF2 Etch (Xetch)]]
+
*[[Plasma Clean (Gasonics 2000)]]
  +
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
* [[Plasma Activation Tool (EVG 810)]]
 
  +
*[[Plasma Activation Tool (EVG 810)]]
* [[HF Vapor Etch]]
 
  +
*[[HF Vapor Etch]]
|-
 
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Revision as of 19:43, 30 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization