Difference between revisions of "Tool List"

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=Wet Processing=
 
=Wet Processing=
  +
{|
* [[Wet Benches]]
 
  +
|-valign="top"
**[[Photoresist Spin Benches]]
 
  +
|width=300|
**[[Lithography Development & Solvent Clean Benches]]
 
**[[Wet Etch Benches]]
 
* [[Scales]]
 
** [[Wet Etch Wafer Scale]]
 
** [[Solvent Processing Wafer Scale]]
 
 
* [[Gold Plating Bench]]
 
* [[Gold Plating Bench]]
 
* [[Critical Point Dryer]]
 
* [[Critical Point Dryer]]
 
* [[Spin Rinse Dryer (SemiTool)]]
 
* [[Spin Rinse Dryer (SemiTool)]]
 
* [[Scales]]
 
** [[Wet Etch Wafer Scale]]
 
** [[Solvent Processing Wafer Scale]]
  +
|width=400|
 
* [[Chemical-Mechanical Polisher (Logitech)]]
 
* [[Chemical-Mechanical Polisher (Logitech)]]
 
* [[Wet Benches]]
 
**[[Photoresist Spin Benches]]
 
**[[Lithography Development & Solvent Clean Benches]]
 
**[[Wet Etch Benches]]
  +
|-
  +
|}
   
 
=Thermal Processing=
 
=Thermal Processing=

Revision as of 12:55, 28 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization