Difference between revisions of "Tool List"

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(Vacuum Deposition)
(Dry Etch)
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{|
 
{|
 
|-valign="top"
 
|-valign="top"
|width=200|
+
|width=300|
* [[RIE 1]]
+
* [[RIE 1 (Custom)]]
* [[RIE 2]]
+
* [[RIE 2 (MRC)]]
* [[RIE 3]]
+
* [[RIE 3 (MRC)]]
* [[RIE 5]]
+
* [[RIE 5 (PlasmaTherm SLR)]]
* [[Si Deep RIE]]
+
* [[Si Deep RIE (Bosch Etch)]]
* [[Ashers]]
+
* [[Ashers (Technics PEII]]
 
* [[Unaxis VLR ICP-Etch]]
 
* [[Unaxis VLR ICP-Etch]]
|width=200|
+
|width=400|
* [[ICP Etch 1]]
+
* [[ICP Etch 1 (Panasonic E620)]]
* [[ICP Etch 2]]
+
* [[ICP Etch 2 (Panasonic E626)]]
 
* [[UV Ozone Reactor]]
 
* [[UV Ozone Reactor]]
* [[Plasma Clean]]
+
* [[Plasma Clean (Gasonics 2000)]]
* [[XeF2 Etch]]
+
* [[XeF2 Etch (Xetch)]]
* [[Plasma Activation Tool]]
+
* [[Plasma Activation Tool (EVG 810)]]
  +
* [[HF Vapor Etch]]
 
|-
 
|-
 
|}
 
|}

Revision as of 11:50, 28 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization