Difference between revisions of "Tool List"

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(Vacuum Deposition)
(Lithography)
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{|
 
{|
 
|-valign="top"
 
|-valign="top"
|width=200|
+
|width=400|
 
* [[Suss Aligners (SUSS MJB-3)]]
 
* [[Suss Aligners (SUSS MJB-3)]]
 
* [[IR Aligner (SUSS MJB-3 IR)]]
 
* [[IR Aligner (SUSS MJB-3 IR)]]
 
* [[DUV Flood Expose]]
 
* [[DUV Flood Expose]]
* [[Ovens]]
+
* [[Ovens 1, 2 & 3 (Labline)]]
  +
* [[Oven 4 (Fisher)]]
|width=200|
 
  +
* [[Oven 5 (Blue M)]]
  +
* [[Vacuum Oven (YES)]]
  +
* [[Holographic Lith/PL Setup]]
  +
|width=400|
 
* [[Stepper 1 (GCA 6300)]]
 
* [[Stepper 1 (GCA 6300)]]
 
* [[Stepper 2 (AutoStep 200)]]
 
* [[Stepper 2 (AutoStep 200)]]
 
* [[Stepper 3 (ASML)]]
 
* [[Stepper 3 (ASML)]]
 
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
 
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
  +
* [[AFM-based Nanolithography Tool (NanoMan)]]
 
* [[Nano-Imprint Tool (Nanonex NX2000)]]
 
* [[Nano-Imprint Tool (Nanonex NX2000)]]
 
* [[Contact Aligner (SUSS MA-6)]]
 
* [[Contact Aligner (SUSS MA-6)]]

Revision as of 11:43, 28 June 2012

Lithography

Vacuum Deposition

Dry Etch

Wet Processing

Thermal Processing

Packaging

Inspection, Test and Characterization