Difference between revisions of "Tool List"

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(Lithography)
(Vacuum Deposition)
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* [[E-Beam 3]]
 
* [[E-Beam 3]]
 
* [[E-Beam 4]]
 
* [[E-Beam 4]]
* [[Sputter 1]]
+
* [[Sputter 1 (Custom)]]
* [[Sputter 2]]
+
* [[Sputter 2 (SFI Endeavor)]]
 
* [[Sputter 3]]
 
* [[Sputter 3]]
 
* [[Sputter 4]]
 
* [[Sputter 4]]
 
|width=200|
 
|width=200|
* [[Sputter 5]]
+
* [[Sputter 5 (Lesker AXXIS)]]
 
* [[PECVD 1]]
 
* [[PECVD 1]]
* [[PECVD 2]]
+
* [[PECVD 2 (Advanced Vacuum)]]
 
* [[Unaxis VLR ICP-PECVD]]
 
* [[Unaxis VLR ICP-PECVD]]
 
* [[IBD]]
 
* [[IBD]]
 
* [[Molecular Vapor Deposition]]
 
* [[Molecular Vapor Deposition]]
* [[Atomic Layer Deposision]]
+
* [[Atomic Layer Deposision (Oxford Flexal)]]
 
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|-
 
|}
 
|}
  +
 
=Dry Etch=
 
=Dry Etch=
 
{|
 
{|

Revision as of 10:30, 28 June 2012