Difference between revisions of "Tool List"

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__NOTOC__
  
__NOTOC__
 
=Lithography=
  
=Lithography=
  +
−
You can see our available photoresists on the [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemical_Datasheets Chemical Datasheets page].
  
 
{|
  
{|
 
|- valign="top"
  
|- valign="top"
 
| width="300" |
  
| width="300" |
  +
=====Photoresists and Lithography Chemicals=====
−
* [[Suss Aligners (SUSS MJB-3)]]
  
  +
−
* [[IR Aligner (SUSS MJB-3 IR)]]
  
  +
*See the [https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Chemical Datasheets page].
−
* [[DUV Flood Expose]]
  
  +
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
−
* [[Ovens 1, 2 & 3 (Labline)]]
  
  +
−
* [[Oven 4 (Fisher)]]
  
  +
=====Contact Aligners (Optical Exposure)=====
−
* [[Oven 5 (Labline)]]
  
  +
−
* [[High Temp Oven (Blue M)]]
  
−
* [[Vacuum Oven (YES)]]
 +
*[[Suss Aligners (SUSS MJB-3)]]
  +
*[[IR Aligner (SUSS MJB-3 IR)]]
−
* [[Holographic Lith/PL Setup (Custom)]]
  
  +
*[[Contact Aligner (SUSS MA-6)]]
  +
*[[DUV Flood Expose]]
  +
  +
=====Other Patterning Systems=====
  +
  +
*[[E-Beam Lithography System (JEOL JBX-6300FS)]]
  +
*[[Nano-Imprint (Nanonex NX2000)]]
  +
*[[Holographic Lith/PL Setup (Custom)|Holographic Litho/PL Setup (Custom)]]
 
| width="400" |
  
| width="400" |
  +
=====Steppers (Optical Exposure)=====
−
* [[Stepper 1 (GCA 6300)]]
  
  +
−
* [[Stepper 2 (AutoStep 200)]]
  
−
* [[Stepper 3 (ASML DUV)]]
 +
*[[Stepper 1 (GCA 6300)|Stepper 1 (GCA 6300, i-line)]]
  +
*[[Stepper 2 (AutoStep 200)|Stepper 2 (AutoStep 200, i-line)]]
−
* [[E-Beam Lithography System (JEOL JBX-6300FS)]]
  
  +
*[[Stepper 3 (ASML DUV)|Stepper 3 (ASML DUV, Deep-UV)]]
−
* [[Nano-Imprint (Nanonex NX2000)]]
  
  +
−
* [[Contact Aligner (SUSS MA-6)]]
  
  +
=====Thermal Processing for Photolithography=====
  +
  +
*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all lab ovens]]
  +
*[[Ovens 1, 2 & 3 (Labline)]]
  +
*[[Oven 4 (Fisher)]]
  +
*[[Oven 5 (Labline)]]
  +
*[[High Temp Oven (Blue M)]]
  +
*[[Vacuum Oven (YES)]]
  +
  +
=====Lithography Support=====
  +
  +
*The [https://www.nanotech.ucsb.edu/wiki/index.php/Wet_Benches#Spin_Coat_Benches Spinner Benches] have pre-set hotplates at various temperatures appropriate for common photoresist bakes.
  +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 POLOS spinners] on Develop and Solvent benches
  +
*[[Spin Rinse Dryer (SemiTool)|Spin/Rinse/Dryer]]
 
|-
  
|-
 
|}
  
|}
   
−
= Vacuum Deposition =
 +
=Vacuum Deposition=
   
 
{|
  
{|
 
|- valign="top"
  
|- valign="top"
−
| width="300" |
+
| width="300" |
  +
=====Physical Vapor Deposition (PVD)=====
−
*[[E-Beam 1 (Sharon)]]
 
  +
−
*[[E-Beam 2 (Custom)]]
 
−
*[[E-Beam 3 (Temescal)]]
+
*[[E-Beam 1 (Sharon)]]
−
*[[E-Beam 4 (CHA)]]
+
*[[E-Beam 2 (Custom)]]
  +
*[[E-Beam 3 (Temescal)]]
−
*[[Removed]]
 
−
*[[Sputter 3 (AJA ATC 2000-F)]]
+
*[[E-Beam 4 (CHA)]]
  +
*[[Thermal Evap 1]]
−
*[[Sputter 4 (AJA ATC 2200-V)]]
 
−
*[[Sputter 5 (Lesker AXXIS)]]
 +
*[[Thermal Evap 2 (Solder)]]
  +
  +
=====Sputter Deposition=====
  +
  +
*[[Sputter 3 (AJA ATC 2000-F)]]
  +
*[[Sputter 4 (AJA ATC 2200-V)]]
  +
*[[Sputter 5 (AJA ATC 2200-V)]]
  +
*[[Ion Beam Deposition (Veeco NEXUS)]]
  +
  +
| width="400" |
  +
=====Chemical Vapor Deposition (CVD)=====
   
  +
*[[PECVD 1 (PlasmaTherm 790)]]
−
| width="400" |
 
−
*[[PECVD 1 (PlasmaTherm 790)]]
+
*[[PECVD 2 (Advanced Vacuum)]]
−
*[[PECVD 2 (Advanced Vacuum)]]
+
*[[ICP-PECVD (Unaxis VLR)]]
−
*[[Thermal Evap 1]]
+
*[[Molecular Vapor Deposition]]
−
*[[Thermal Evap 2 (Solder)]]
 
−
*[[ICP-PECVD (Unaxis VLR)]]
 
−
*[[Ion Beam Deposition (Veeco NEXUS)]]
 
−
*[[Molecular Vapor Deposition]]
 
 
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
  
*[[Atomic Layer Deposision (Oxford FlexAL)|Atomic Layer Deposition (Oxford FlexAL)]]
   
 
|}
  
|}
   
−
= Dry Etch =
 +
=Dry Etch=
   
 
{|
  
{|
 
|- valign="top"
  
|- valign="top"
−
| width="300" |
+
| width="300" |
  +
=====Reactive Ion Etching (RIE)=====
−
*[[RIE 2 (MRC)]]
 
  +
−
*[[RIE 3 (MRC)]]
 
−
*[[RIE 5 (PlasmaTherm)]]
+
*[[RIE 2 (MRC)]]
−
*[[Si Deep RIE (PlasmaTherm/Bosch Etch)]]
+
*[[RIE 3 (MRC)]]
−
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)]]
+
*[[RIE 5 (PlasmaTherm)]]
  +
−
*[[Ashers (Technics PEII)]]
 
  +
=====Plasma Etching and Cleaning=====
−
*[[UV Ozone Reactor]]
 
  +
−
*[[CAIBE (Oxford Ion Mill)]]
 
  +
*[[Plasma Clean (Gasonics 2000)]]
−
| width="400" |
 
−
*[[ICP Etch 1 (Panasonic E626I)]]
+
*[[Plasma Clean (YES EcoClean)]]
−
*[[ICP Etch 2 (Panasonic E640)]]
+
*[[Plasma Activation (EVG 810)]]
  +
*[[Ashers (Technics PEII)]]
  +
  +
=====Etch Monitoring=====
  +
  +
*[[Laser Etch Monitoring]] (Endpoint Detection)
  +
*Optical Emission Spectra
  +
*Residual Gas Analyzer (RGA)
  +
| width="400" |
  +
=====ICP-RIE=====
  +
  +
*[[ICP Etch 1 (Panasonic E626I)]]
  +
*[[ICP Etch 2 (Panasonic E640)]]
 
*[[ICP-Etch (Unaxis VLR)]]
  
*[[ICP-Etch (Unaxis VLR)]]
  +
*[[Fluorine ICP Etcher (PlasmaTherm/SLR Fluorine ICP)|Plasma-Therm SLR: Fluorine ICP (PlasmaTherm/SLR Fluorine Etcher)]]
−
*[[Plasma Clean (Gasonics 2000)]]
 
  +
*[[DSEIII (PlasmaTherm/Deep Silicon Etcher)|Plasma-Therm DSE-iii (PlasmaTherm/Deep Silicon Etcher)]]
−
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
 
  +
−
*[[Plasma Activation (EVG 810)]]
 
  +
=====Ion Milling and Reactive Ion Beam Etching=====
  +
  +
*[[CAIBE (Oxford Ion Mill)]]
  +
  +
=====Other Dry Etching=====
  +
  +
*[[UV Ozone Reactor]]
  +
*[[XeF2 Etch (Xetch)|XeF<sub>2</sub> Etch (Xetch)]]
 
*[[Vapor HF Etch]]
  
*[[Vapor HF Etch]]
  +
   
 
|}
  
|}
   
 
=Wet Processing=
  
=Wet Processing=
−
The [[Chemical List|Chemical List page]] lists available chemicals such as Developers, Acids, Solvents etc.
 +
See the [[Chemical List|Chemical List page]] for stocked chemicals such as Developers, Etchants, Solvents etc.
 
{|
  
{|
 
|- valign="top"
  
|- valign="top"
 
| width="300" |
  
| width="300" |
−
* [[Wet Benches]]
 +
*[[Wet Benches]]
 
**[[Solvent Cleaning Benches]]
  
**[[Solvent Cleaning Benches]]
 
**[[Spin Coat Benches]]
  
**[[Spin Coat Benches]]
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**[[Plating Bench]]
  
**[[Plating Bench]]
 
| width="400" |
  
| width="400" |
−
* [[Gold Plating Bench]]
 +
*[[Gold Plating Bench]]
−
* [[Critical Point Dryer]]
 +
*[[Critical Point Dryer]]
−
* [[Spin Rinse Dryer (SemiTool)]]
 +
*[[Spin Rinse Dryer (SemiTool)]]
−
* [[Chemical-Mechanical Polisher (Logitech)]]
 +
*[[Chemical-Mechanical Polisher (Logitech)]]
  +
*[[Automated Coat/Develop System (S-Cubed Flexi)|Auto. Coat/Develop (S-Cubed Flexi)]]
  +
*[https://signupmonkey.ece.ucsb.edu/wiki/index.php/Wet_Benches#Automated_Wet-processing_Spinners_.28POLOS.29 Auto. Wet-Processing Spinners (POLOS)]
 
|-
  
|-
 
|}
  
|}
   
 
=Thermal Processing=
  
=Thermal Processing=
  +
{|
−
* [[Rapid Thermal Processor (AET RX6)]]
  
  +
|- valign="top"
−
* [[Strip Annealer]]
  
  +
| width="400" |
−
* [[Tube Furnace (Tystar 8300)]]
  
  +
*[[Rapid Thermal Processor (AET RX6)|Rapid Thermal Annealer/Processor "RTA" (AET RX6)]]
−
* [[Tube Furnace Wafer Bonding (Thermco)]]
  
  +
*[[Rapid Thermal Processor (SSI Solaris 150)]]
−
* [[Tube Furnace AlGaAs Oxidation (Linberg)]]
  
−
* [[Wafer Bonder (SUSS SB6-8E)]]
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*[[Tube Furnace (Tystar 8300)]]
−
* [[Ovens 1, 2 & 3 (Labline)]]
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*[[Tube Furnace Wafer Bonding (Thermco)]]
  +
*[[Tube Furnace AlGaAs Oxidation (Lindberg)]]
−
* [[Oven 4 (Fisher)]]
  
−
* [[Oven 5 (Labline)]]
 +
*[[Wafer Bonder (SUSS SB6-8E)]]
  +
*[[Wafer Bonder (Logitech WBS7)|Wafer Bonder/Wax Mounting (Logitech WBS2)]]
−
* [[High Temp Oven (Blue M)]]
  
  +
| width="400" |
−
* [[Vacuum Oven (YES)]]
  
  +
*[[Ovens - Overview of All Lab Ovens|Ovens - Overview of all Lab Ovens]]
  +
**[[Ovens 1, 2 & 3 (Labline)]]
  +
**[[Oven 4 (Thermo-Fisher HeraTherm)]]
  +
**[[Oven 5 (Labline)]]
  +
**[[Vacuum Oven (YES)]]
  +
**[[High Temp Oven (Blue M)]]
  +
|-
  +
|}
   
 
=Packaging=
  
=Packaging=
  +
−
* [[Dicing Saw (ADT)]]
  
−
* [[Flip-Chip Bonder (Finetech)]]
 +
*[[Dicing Saw (ADT)]]
  +
*[[Flip-Chip Bonder (Finetech)]]
−
* [[Vacuum Sealer]]
  
−
* [[Wire Saw (Takatori)]]
 +
*[[Vacuum Sealer]]
  +
*[[Wire Saw (Takatori)]]
   
 
=Inspection, Test and Characterization=
  
=Inspection, Test and Characterization=
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|- valign="top"
  
|- valign="top"
 
| width="300" |
  
| width="300" |
  +
=====Optical/Electron Microscopy=====
−
* [[Field Emission SEM 1 (FEI Sirion)]]
  
  +
−
* [[Field Emission SEM 2 (JEOL 7600F)]]
  
  +
*[[Microscopes|Optical Microscopes]]
−
* [[Step Profile (Dektak IIA)]]
  
−
* [[Step Profilometer (Dektak 6M)]]
 +
*[[Fluorescence Microscope (Olympus MX51)]]
  +
*[[Deep UV Optical Microscope (Olympus)]]
−
* [[Ellipsometer (Rudolph)]]
  
  +
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
−
* [[Microscopes]]
  
  +
*[[Photo-emission & IR Microscope (QFI)|Photo-emission & Thermal IR Microscope (QFI)]]
−
* [[Probe Station & Curve Tracer]]
  
  +
*[[Field Emission SEM 1 (FEI Sirion)]]
−
* [[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
  
  +
*[[Field Emission SEM 2 (JEOL 7600F)]]
−
* Optical Film Thickness (Microscope-Mounted Filmetrics XYZ)
  
−
* [[Optical Film Thickness (Nanometric)]]
 +
*[[SEM Sample Coater (Hummer)]]
  +
−
* [[Goniometer]]
  
  +
=====Topographical Metrology=====
  +
  +
*[[Step Profilometer (KLA Tencor P-7)]]
  +
*[[Step Profilometer (Dektak 6M)]]
  +
*[[Atomic Force Microscope (Bruker ICON)|Atomic Force Microsope (Bruker ICON)]]
  +
*[[Surface Analysis (KLA/Tencor Surfscan)]]
  +
**''Sub-micron Particle Counter''
  +
*[[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  +
*[[Optical Profilometer - White-Light/Phase-Shift Interference (Filmetrics Profilm3D)]]
 
| width="400" |
  
| width="400" |
  +
=====Thin-Film Analysis/Measurement=====
−
* [[Film Stress (Tencor Flexus)]]
  
  +
−
* [[SEM Sample Coater (Hummer)]]
  
  +
*[[Ellipsometer (Woollam)]]
−
* [[Surface Analysis (KLA/Tencor Surfscan)]]
  
  +
*[[Film Stress (Tencor Flexus)]]
−
* [[Photo-emission & IR Microscope (QFI)]]
  
  +
*[[Filmetrics F40-UV Microscope-Mounted|Optical Film Thickness (Microscope-Mounted Filmetrics F-40-UV)]]
−
* [[Ellipsometer (Woollam)]]
  
  +
*[[Optical Film Thickness (Filmetrics)|Optical Film Thickness (Filmetrics F20)]]
−
* [[Resistivity Mapper (CDE RESMAP)]]
  
  +
*[[Optical Film Thickness & Wafer-Mapping (Filmetrics F50)]]
−
* [[Laser Scanning Confocal M-scope (Olympus LEXT)]]
  
  +
*[[Optical Film Spectra + Optical Properties (Filmetrics F10-RT-UVX)|Reflection/Transmission Spectra & Optical Film Thickness (Filmetrics F10-RT-UVX)]]
−
* [[Deep UV Optical Microscope (Olympus)]]
  
  +
*[[Optical Film Thickness (Nanometric)]]
−
* [[Fluorescence Microscope (Olympus MX51)]]
 
  +
*[[Resistivity Mapper (CDE RESMAP)]]
−
* [[Atomic Force Microsope (Dimension 3100/Nanoscope IVA)]]
  
  +
  +
=====Other Tools=====
  +
  +
*[[Probe Station & Curve Tracer]]
  +
*[[Goniometer]]
  +
*[[Photoluminescence PL Setup (Custom)]]
 
|-
  
|-
 
|}
  
|}

Revision as of 12:09, 20 February 2020

Lithography

Photoresists and Lithography Chemicals
Contact Aligners (Optical Exposure)
Other Patterning Systems
Steppers (Optical Exposure)
Thermal Processing for Photolithography
Lithography Support

Vacuum Deposition

Physical Vapor Deposition (PVD)
Sputter Deposition
Chemical Vapor Deposition (CVD)

Dry Etch

Reactive Ion Etching (RIE)
Plasma Etching and Cleaning
Etch Monitoring
ICP-RIE
Ion Milling and Reactive Ion Beam Etching
Other Dry Etching


Wet Processing

See the Chemical List page for stocked chemicals such as Developers, Etchants, Solvents etc.

Thermal Processing

Packaging

Inspection, Test and Characterization

Optical/Electron Microscopy
Topographical Metrology
Thin-Film Analysis/Measurement
Other Tools
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Tool_List&oldid=157127"