Difference between revisions of "Test Data of etching SiO2 with CHF3/CF4-ICP1"
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|[https://www.nanotech.ucsb.edu/wiki/images/c/c6/I11903.pdf] |
|[https://www.nanotech.ucsb.edu/wiki/images/c/c6/I11903.pdf] |
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+ | |1/13/2020 |
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+ | |I12001 |
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+ | |78.0 |
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+ | |1.06 |
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